RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20160145231A1
公开(公告)日:2016-05-26
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040167322A1
公开(公告)日:2004-08-26
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
Photoacid generators, chemically amplified resist compositions, and patterning process
申请人:Ohsawa Youichi
公开号:US20070292768A1
公开(公告)日:2007-12-20
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.
NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Ohsawa Youichi
公开号:US20090246694A1
公开(公告)日:2009-10-01
Photoacid generators generate sulfonic acids of formula (
1
a) upon exposure to high-energy radiation.
ROC(═O)R
1
—COOCH
2
CF
2
SO
3
−
H
+
(1a)
RO is OH or C
1
-C
20
organoxy, R
1
is a divalent C
1
-C
20
aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.