2,5,8,11-四甲基-5-癸炔-4,7-二醇,乙氧基化物 | 169117-72-0

• 物质功能分类: 催化剂及助剂 - 聚合物
• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 2,5,8,11-四甲基-5-癸炔-4,7-二醇,乙氧基化物
• 中文别名: 2,5,8,11-四甲Ethoxylated-2,5,8,11-Tetramethyl-6-Dodecyn-5,8-Dio
• 英文名称: 2-[8-(2-Hydroxyethoxy)-2,5,8,11-tetramethyldodec-6-yn-5-yl]oxyethanol
• 英文别名: 2-[8-(2-hydroxyethoxy)-2,5,8,11-tetramethyldodec-6-yn-5-yl]oxyethanol
• CAS: 169117-72-0
• 化学式: C₂₀H₃₈O₄
• 分子量: 342.5
• InChiKey: JLFFIGVCKGNBJC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  24
• 可旋转键数：
  14
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  58.9
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• SUPPRESSING SIN REMOVAL RATES AND REDUCING OXIDE TRENCH DISHING FOR SHALLOW TRENCH ISOLATION (STI) PROCESS
  申请人：Versum Materials US, LLC

  公开号：EP3647384A1

  公开（公告）日：2020-05-06

  Present invention provides Chemical Mechanical Planarization Polishing (CMP) compositions for Shallow Trench Isolation (STI) applications. The CMP compositions contain ceria coated inorganic oxide particles as abrasives, such as ceria-coated silica particles; chemical additive selected from the group consisting of an organic acetylene molecule containing an acetylene bond and at least two or multi ethoxylate functional groups with terminal hydroxyl groups, an organic molecule with at least two or multi hydroxyl functional groups in the same molecule, and combinations thereof; water soluble solvent; and optionally biocide and pH adjuster; wherein the composition has a pH of 2 to 12, preferably 3 to 10, and more preferably 4 to 9.

  本发明提供了用于浅沟隔离（STI）的化学机械平面抛光（CMP）组合物。CMP 组合物包含作为磨料的铈包覆无机氧化物颗粒，例如铈包覆二氧化硅颗粒；化学添加剂，选自以下组别：含有乙炔键和至少两个或多个带有末端羟基的乙氧基官能团的有机乙炔分子、在同一分子中含有至少两个或多个羟基官能团的有机分子及其组合；水溶性溶剂；以及可选的杀菌剂和 pH 值调节剂；其中组合物的 pH 值为 2 至 12，优选 3 至 10，更优选 4 至 9。
• Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process
  申请人：Versum Materials US, LLC

  公开号：US11180678B2

  公开（公告）日：2021-11-23

  Present invention provides Chemical Mechanical Planarization Polishing (CMP) compositions for Shallow Trench Isolation (STI) applications. The CMP compositions contain ceria coated inorganic oxide particles as abrasives, such as ceria-coated silica particles; chemical additive selected from the group consisting of an organic acetylene molecule containing an acetylene bond and at least two or multi ethoxylate functional groups with terminal hydroxyl groups, an organic molecule with at least two or multi hydroxyl functional groups in the same molecule, and combinations thereof; water soluble solvent; and optionally biocide and pH adjuster; wherein the composition has a pH of 2 to 12, preferably 3 to 10, and more preferably 4 to 9.

  本发明提供了用于浅沟隔离（STI）的化学机械平面抛光（CMP）组合物。CMP 组合物包含作为磨料的铈包覆无机氧化物颗粒，例如铈包覆二氧化硅颗粒；化学添加剂，选自以下组别：含有乙炔键和至少两个或多个带有末端羟基的乙氧基官能团的有机乙炔分子、在同一分子中含有至少两个或多个羟基官能团的有机分子及其组合；水溶性溶剂；以及可选的杀菌剂和 pH 值调节剂；其中组合物的 pH 值为 2 至 12，优选 3 至 10，更优选 4 至 9。
• PRE-TREATMENT COMPOSITIONS FOR INKJET PRINTING
  申请人：Sarkisian George

  公开号：US20120314000A1

  公开（公告）日：2012-12-13

  The present disclosure provides for a pre-treatment composition for inkjet printing, comprising: a liquid vehicle, a fixing agent, a non-ionic defoaming surfactant, a surface tension reducing surfactant, and a latex resin having an acid number of less than 20.
• INK COMPOSITION
  申请人：OCE-TECHNOLOGIES B.V.

  公开号：US20140364548A1

  公开（公告）日：2014-12-11

  The present invention relates to an ink composition suitable for being ejected from an inkjet marking device at an operating temperature. The ink composition comprises a water-dispersible resin and has a dynamic surface tension of below 35 mN/m and a static surface tension of above 21 mN/m both determined at the operating temperature. The ink composition may comprise a mixture of water-soluble organic solvents having a difference in the relative dielectric constant of more than 5, preferably between 10 and 50. The ink composition may comprise a polymeric cosolvent, in particular a polyethylene glycol or polyethylene glycol (di)methyl ether. The ink composition may comprise a mixture of surfactants comprising at least one surfactant of a first type selected from the group consisting of acetylene glycols and ethoxylated acetylene glycols and at least one surfactant of a second type selected from the group consisting of silicone surfactants and fluorochemical surfactants.
• FLUOROSURFACTANTS IN PESTICIDES
  申请人：MERCK PATENT GMBH

  公开号：US20160122297A1

  公开（公告）日：2016-05-05

  The present invention relates to the use of fluorinated surfactants of formula (I) in pesticides.