[EN] ADHESIVE PHOTOPROTECTIVE COMPOUNDS AND USES THEREOF<br/>[FR] COMPOSÉS PHOTO-PROTECTEURS ADHÉSIFS ET LEURS UTILISATIONS
申请人:SKINOSIVE
公开号:WO2021123116A1
公开(公告)日:2021-06-24
The present invention relates to a compound represented by the following formula (I): A[B-(C)v]w, wherein A is a photoprotective moiety, B is a linker, C is a functional group, v is an integer from 1 to 2000, and w is an integer from 1 to 6. It also relates to a composition comprising the same and, more particularly, to a cosmetic or a sunscreen composition. It also relates to the use of such compounds in cosmetic and therapeutic applications. The invention also relates to the use of such compounds for reducing photodegradation and/or photoinstability of pharmaceuticals and cosmetics. The invention further relates to a material comprising a support and such a compound adhered to said support.
[EN] A PROCESS FOR THE PREPARATION OF UV ABSORBERS<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ABSORBEURS UV
申请人:BASF SE
公开号:WO2020144094A1
公开(公告)日:2020-07-16
The presently claimed invention relates to a novel, highly efficient and general process for the preparation of UV absorbers.
目前所声称的发明涉及一种新颖、高效和通用的紫外线吸收剂制备过程。
[EN] IMPACT OF TRACE ELEMENTS IN THE GRIGNARD REACTION<br/>[FR] IMPACT D'ÉLÉMENTS TRACE DANS LA RÉACTION DE GRIGNARD
申请人:BASF SE
公开号:WO2020193617A1
公开(公告)日:2020-10-01
The present invention relates to an improved process for preparing 2,4-dichloro-6-(4- methoxyphenyl)-1,3,5-triazine (DICAT) comprising reacting 4-bromoanisole with magnesium, and reacting the resulting Grignard reagent with cyanuric chloride, wherein the magnesium comprises additional metals as impurities in an amount of less than 0.027 % by weight, based on the total weight of the magnesium.
[EN] PROCESS FOR THE PREPARATION OF TRIAZINES<br/>[FR] PROCÉDÉ POUR LA PRÉPARATION DE TRIAZINES
申请人:DSM IP ASSETS BV
公开号:WO2016184764A1
公开(公告)日:2016-11-24
The invention relates to an improved process for the manufacture of bis-resorcinyl triazines of formula (I) wherein R1 is a C1C18alkyl group or C2-C18alkenyl group as well as the respective alkyl substituted bis-resorcinyl derivatives of formula (II) wherein R1 is a C1-C18alkyl group or C2-C18alkenyl group and R2 and R3 are independently of each other a C1-C18alkyl group or a C2-C18alkenyl group.
申请人:ASTech. Co., Ltd. (주)에이에스텍(120070240527) Corp. No ▼ 135111-0074800BRN ▼123-86-01591
公开号:KR20190136506A
公开(公告)日:2019-12-10
본 발명은 트리아진계 화합물 및 이의 유도체의 제조방법에 관한 것으로, 본 발명의 일 실시형태에 따른 트리아진계 화합물의 제조방법은 염화시아누르(Cyanuric Chloride), 아니솔(anisole) 및 레조르시놀(Resorcinol)을 반응시켜 하기 화학식 1로 표시되는 트리아진계 화합물을 제조할 수 있다. [화학식 1]