Ethylene glycol derivatives of ammonioethyl phosphate, their production and use
申请人:Takeda Chemical Industries, Ltd.
公开号:EP0040039A1
公开(公告)日:1981-11-18
New ethylene glycol derivatives, inclusive of salts thereof, which have the formula:
wherein n is an integer of 1 to 15; R1 is an aliphatic hydrocarbon group containing 6 to 26 carbon atoms; R2 R3 and R4 are independently H or lower alkyl, or
represents a cyclic ammonio group, exhibit inhibitory activity to multiplication of tumor cells and antimicrobial activity.
新的乙二醇衍生物,包括其盐类,其式如下
其中 n 是 1 至 15 的整数;R1 是含有 6 至 26 个碳原子的脂肪族烃基;R2 R3 和 R4 独立地是 H 或低级烷基,或
代表环氨基团,具有抑制肿瘤细胞繁殖的活性和抗菌活性。
Print pastes for reactive printing
申请人:Cognis Deutschland GmbH & Co. KG
公开号:EP1249477A1
公开(公告)日:2002-10-16
Pasty preparation for reactive printing, containing at least
A) a thickener based on polysaccharides
B) an additive selected from the group consisting of
B1) the saturated and/or unsaturated ethoxylated fatty alcohols, fatty amines and fatty acids having a degree of alkoxylation of 6 to 20
and/or the group consisting of
B2) alkyl(oligo)glycosides of the formula R-O[G]p where R is a saturated or unsaturated alkyl radical of 1 to 6 carbon atoms, G is a glycoside radical and p is from 1 to 10,
C) a reactive dye and
D) an alkaline colour fixative.
用于活性印刷的糊状制剂,至少含有
A) 基于多糖的增稠剂
B) 选自以下组别的添加剂
B1) 烷氧基化程度为 6 至 20 的饱和和/或不饱和乙氧基化脂肪醇、脂肪胺和脂肪酸
和/或由以下物质组成的组
B2) 式 R-O[G]p 的烷基(低聚)糖苷,其中 R 为 1 至 6 个碳原子的饱和或不饱和烷基,G 为糖苷基,p 为 1 至 10、
C) 活性染料和
D) 一种碱性固色剂。
Haftungsvermindernde oder haftungsverhindernde Oberflächen
申请人:Geberit International AG
公开号:EP2159251A1
公开(公告)日:2010-03-03
Es werden haftungsverminderte Kunststoffe beschrieben, welche ein Matrixpolymer und ein Additiv aus Block-Copolymeren mit einem haftungsvermindernden oder haftungsverhindernden Teil und einem Ankerteilumfassen, wobei der haftungsvermindernde Teil oberflächenmodifizierende Polymere mit einem Heteroatomanteil von ≤ 4 aufweist.
Derart behandelte Oberflächen eignen sich zur Verhinderung oder zur Verminderung der Haftung von Ablagerungen, insbesondere auch von kalkhaltigen Ablagerungen.
Slurry composition for chemical mechanical polishing
申请人:SAMSUNG ELECTRONICS CO., LTD.
公开号:US10428242B2
公开(公告)日:2019-10-01
A slurry composition for chemical mechanical polishing, the slurry composition including ceramic polishing particles; a dispersion agent; a pH control agent and an additive having affinity with silicon nitride.
Various embodiments disclosed relate to methods, compositions, and systems for enhanced oil recovery including a viscosifier polymer. In various embodiments, the present invention provides a method of enhanced oil recovery that can include obtaining or providing a composition that includes a viscosifier polymer. The viscosifier polymer includes an ethylene repeating unit including a —C(O)NH2 group and an ethylene repeating unit including an —S(O)2OR1 group, where the repeating units are in block, alternate, or random configuration. At each occurrence R1 can be independently selected from the group consisting of —H and a counterion. The method can include placing the composition in a subterranean formation downhole via an injection wellbore. The method can also include extracting material comprising petroleum from the subterranean formation downhole via a production wellbore.