4-t-butylcyclohexylether | 110013-03-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-t-butylcyclohexylether
• 英文别名: 1-Tert-butyl-4-(4-tert-butylcyclohexyl)oxycyclohexane
• CAS: 110013-03-1
• 化学式: C₂₀H₃₈O
• 分子量: 294.521
• InChiKey: XZCGKFXUAJNNDP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.6
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  4-叔丁基环己酮 在 indium(III) bromide 、 苯硅烷 作用下， 以 氯仿 为溶剂， 以71%的产率得到4-t-butylcyclohexylether
  参考文献：
  名称：

  InBr 3催化的氢化硅烷还原酮：芳族酮的脱氧和由脂肪族酮选择性合成仲醇和对称醚

  摘要：

  开发了InBr 3 -Et 3 SiH还原系统，以中等至良好的收率选择性地将脂肪族酮转化为多种仲醇。最初混合InBr 3和PhSiH 3，然后添加脂族酮和溶剂，得到对称的醚衍生物。

  DOI：

  10.1016/j.tetlet.2011.04.029

文献信息

• Resist composition
  申请人：Kawaguchi Yasuhide

  公开号：US20050202345A1

  公开（公告）日：2005-09-15

  A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F 2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

  提供了一种抗蚀性组合物，该组合物可以轻松形成透明度优异的抗真空紫外线（例如F2准分子激光器）或干法刻蚀特性，并且在灵敏度、分辨率、平整度、耐热性等方面也具有优异的抗蚀性图案。该抗蚀性组合物的特征在于包含（A）一种含有具有环烷基、一个或多个环烷基或双环烷基等有机基团的阻断基的酸性基团的氟含量高的聚合物，（B）一种能够通过光辐射产生酸的酸发生化合物，以及（C）一种有机溶剂。
• Moisture-Tolerant Frustrated Lewis Pair Catalyst for Hydrogenation of Aldehydes and Ketones
  作者：Ádám Gyömöre、Mária Bakos、Tamás Földes、Imre Pápai、Attila Domján、Tibor Soós

  DOI：10.1021/acscatal.5b01299

  日期：2015.9.4

  In this paper, we report on the development of a bench-stable borane for frustrated Lewis pair catalyzed reduction of aldehydes, ketones, and enones. The deliberate fine-tuning of structural and electronic parameters of Lewis acid component and the choice of Lewis base provided for the first time, a moisture-tolerant FLP catalyst. Related NMR and DFT studies underpinned the unique behavior of this FLP catalyst and gave insight into the catalytic activity of the resulting FLP catalyst.
• SASSAMAN, MARK B.;KOTIAN, KIRTIVAN D.;PRAKASH, G. K. SURYA;OLAH, GEORGE A+, J. ORG. CHEM., 52,(1987) N 19, 4314-4319
  作者：SASSAMAN, MARK B.、KOTIAN, KIRTIVAN D.、PRAKASH, G. K. SURYA、OLAH, GEORGE A+

  DOI：——

  日期：——
• InBr3-catalyzed reduction of ketones with a hydrosilane: deoxygenation of aromatic ketones and selective synthesis of secondary alcohols and symmetrical ethers from aliphatic ketones
  作者：Norio Sakai、Ken Nagasawa、Reiko Ikeda、Yumi Nakaike、Takeo Konakahara

  DOI：10.1016/j.tetlet.2011.04.029

  日期：2011.6

  An InBr3–Et3SiH reducing system was developed to selectively convert aliphatic ketones to a variety of secondary alcohols in moderate to good yields. An initial mixing of InBr3 and PhSiH3 was followed by the addition of aliphatic ketones and a solvent to afford the symmetrical ether derivatives.

  开发了InBr 3 -Et 3 SiH还原系统，以中等至良好的收率选择性地将脂肪族酮转化为多种仲醇。最初混合InBr 3和PhSiH 3，然后添加脂族酮和溶剂，得到对称的醚衍生物。