申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20220348541A1
公开(公告)日:2022-11-03
Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:
wherein R
1
, R
2
and R
3
each represent a hydroxy group, *—O—R
10
, *—O—CO—O—R
10
, etc.; L
10
represents an alkanediyl group; R
10
represents an acid-labile group; R
4
, R
5
, R
6
, R
7
, R
8
and R
9
each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A
1
, A
2
and A
3
each represent a hydrocarbon group which may have a substituent, and —CH
2
— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO
2
—; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI
−
represents an organic anion.
本发明涉及一种由公式(I)表示的盐,酸发生剂以及包括它们的抗蚀剂组合物:其中R1、R2和R3分别表示羟基、*—O—R10、*—O—CO—O—R10等;L10表示脂肪二烷基基团;R10表示酸敏感基团;R4、R5、R6、R7、R8和R9分别表示卤素原子、卤代烷基或烃基;A1、A2和A3分别表示可能具有取代基的烃基,且包括在烃基中的—CH2—可被—O—、—CO—、—S—或—SO2—所替代;m1表示1到5的整数,m2、m3、m8和m9表示0到5的整数,m4到m7表示0到4的整数,1≤m1+m7≤5,0≤m2+m8≤5,0≤m3+m9≤5;AI-表示有机阴离子。