dichloropyromellitic acid | 21021-54-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: dichloropyromellitic acid
• 英文别名: 3,6-Dichlor-benzol-1,2,4,5-tetracarbonsaeure (Dichlor-pyromellitsaeure)；3.6-Dichlor-pyromellitsaeure；Dichlorpyromellithsaeure；Dichlorpyromellitsaeure；3,6-dichlorobenzene-1,2,4,5-tetracarboxylic acid
• CAS: 21021-54-5
• 化学式: C₁₀H₄Cl₂O₈
• mdl: MFCD00424115
• 分子量: 323.043
• InChiKey: HOWNTAOWUDAPEQ-UHFFFAOYSA-N

物化性质

• 熔点：
  190 °C(Solv: water (7732-18-5))
• 沸点：
  544.3±50.0 °C(Predicted)
• 密度：
  1.976±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  149
• 氢给体数：
  4
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  dichloropyromellitic acid 在 乙酸酐 、 溶剂黄146 作用下， 反应 8.0h， 以34%的产率得到dichloropyromellitic dianhydride
  参考文献：
  名称：

  Two-point halogen bonding between 3,6-dihalopyromellitic diimides

  摘要：

  已经合成了几种3,6-二卤代吡啶二酰亚胺。在这些分子和它们与富电子萘的电荷转移复合物的固态超结构中观察到了类似羧酸二聚体的两点分子间卤素-氧相互作用。

  DOI：

  10.1039/c4sc00999a
• 作为产物：
  描述：

  1,2,4,5-四甲苯 在 碘 、 硝酸 、 氯 作用下， 以 Petroleum ether 为溶剂， 生成 dichloropyromellitic acid
  参考文献：
  名称：

  关于均苯四酸和立方酸的衍生物。I.部分

  摘要：

  1.氯丁二烯（I）的氯化得到1,4-二甲基-2,5-双-氯甲基-3,6-二氯苯（IV），化合物XI的氯化得到1,5-二甲基-2,4-双-氯甲基-3,6-二氯苯（XII）。

  DOI：

  10.1002/hlca.19600430402

文献信息

• Polyhaloaromatics. Part V. Synthesis of poly- and perfluoro-1,3,5,7-tetrahydrobenzo[1,2-c:4,5-c′] difurans
  作者：Jacek Porwisiak、Wojciech Dmowski

  DOI：10.1016/s0022-1139(00)80312-7

  日期：1991.1

  Treatment of dichloro- or dibromopyromellitic acids 1 or 2 with a mixture of sulphur tetrafluoride and hydrogen fluoride gave the respective 4,8-dihalo-1,1,3,3,5,5,7,7-octafluoro-1,3,5,7-tetrahydrobenzo[1,2-c:4,5-c′]difurans (3) and (4) in high yields. Dichloro compound 3 easily undergoes halogen-exchange with potassium fluoride to give perfluoro-1,3,5,7-tetrahydrobenzo[1,2-c:4,5-c′]difuran (5). Reduction

  用四氟化硫和氟化氢的混合物处理二氯-或二溴均苯四甲酸1或2，分别得到4,8-二卤代-1,1,3,3,5,5,7,7-八氟-1,3， 5,7-四氢苯并[1,2-c：4,5-c']二呋喃（3）和（4）。二氯化合物3易于与氟化钾进行卤素交换，得到全氟-1,3,5,7-四氢苯并[1,2-c：4,5-c']二呋喃（5）。根据反应条件，用氢化铝锂还原二溴化合物4，得到1,1,3,3,5,5,5,7,7-八氟-1,3,5,7-四氢苯并[1,2- c：4,5-c']二呋喃（6）或4-溴-1,1,3,3,5,5,7,7-八氟-1,3,5,7-四氢苯并[1,2-c，4,5-c']二呋喃（7）。
• Method and apparatus for production of fluorine-containing polyimide film
  申请人：Nippon Shokubai Co., Ltd.

  公开号：EP1454945A1

  公开（公告）日：2004-09-08

  A method for producing a fluorine-containing polyimide film excelling in heat resistance, resistance to chemicals, water repellency, dielectric properties, electrical properties, and optical properties and a spin coater suitable for the method are to be provided. A method for the production of a fluorine-containing polyimide film which comprises forming a coating film of a fluorine-containing polyimide precursor in an atmosphere having a relative humidity thereof adjusted to a level of not more than 50 RH% and then subjecting the fluorine-containing polyimide precursor to heat treatment thereby forming a fluorine-containing polyimide film is provided. By adjusting the relative humidity in accordance with this method, the fluorine-containing polyimide precursor can be prevented from being decomposed by the absorption of moisture. This measure effectively prevents the fluorine-containing polyimide film from forming piriform spots and scratches.

  本发明将提供一种生产耐热性、耐化学性、防水性、介电性能、电性能和光学性能优异的含氟聚酰亚胺薄膜的方法，以及一种适用于该方法的旋涂机。本发明提供了一种生产含氟聚酰亚胺薄膜的方法，该方法包括在相对湿度调节至不超过 50 RH% 的气氛中形成含氟聚酰亚胺前体涂膜，然后对含氟聚酰亚胺前体进行热处理，从而形成含氟聚酰亚胺薄膜。按照这种方法调节相对湿度，可以防止含氟聚酰亚胺前体因吸湿而分解。这一措施可有效防止含氟聚酰亚胺薄膜形成盗形斑和划痕。
• Fluorinated polyamide acid resin composition for optical materials
  申请人：NIPPON SHOKUBAI CO., LTD.

  公开号：EP1757957A2

  公开（公告）日：2007-02-28

  A fluorinated polyamide acid resin composition for optical materials containing a fluorinated polyamide acid and a non-polycondensable compound (A) with an aromatic ring having a boiling point of 340°C or lower, the resin composition being used for obtaining a fluorinated polyimide membrane by a baking process. This fluorinated polyamide acid resin composition for optical materials contains a non-polycondensable compound (A) which was found to reduce a light absorption at 1.49 µm and a light absorption at 1.35 µm and extending to visible light, even if the baking temperature is 340°C or lower.

  一种光学材料用氟化聚酰胺酸树脂组合物，含有氟化聚酰胺酸和沸点为 340°C 或更低的带有芳香环的不聚凝化合物 (A)，该树脂组合物用于通过烘烤工艺获得氟化聚酰亚胺膜。这种用于光学材料的氟化聚酰胺酸树脂组合物含有一种非聚凝性化合物 (A)，即使烘烤温度为 340°C 或更低，它也能降低 1.49 µm 处的光吸收和 1.35 µm 处的光吸收，并延伸至可见光。
• Halogenated polyamide acid composition and its applications
  申请人：NIPPON SHOKUBAI CO., LTD.

  公开号：EP1760114A2

  公开（公告）日：2007-03-07

  A halogenated polyamide acid composition containing a halogenated polyamide acid, a metal oxide precursor, a catalyst of reaction of generating a metal oxide from the precursor, and/or a coupling agent having a reactive group. A halogenated polyimide film is obtained by, for example, carrying out the heat treatment of the halogenated polyamide acid composition. The halogenated polyimide film has a refractive index at wavelength of, for example, 1,550 nm of 1.520 or lower. Further, an optical waveguide uses the halogenated polyimide film as at least one of a core layer and a clad layer, and a relative refractive index difference between the core layer and the clad layer of the optical waveguide is, for example, 0.6 or greater. An optical waveguide device contains such an optical waveguide.

  卤化聚酰胺酸组合物，含有卤化聚酰胺酸、金属氧化物前体、从前体生成金属氧化物的反应催化剂和/或具有活性基团的偶联剂。例如，通过对卤化聚酰胺酸组合物进行热处理，可获得卤化聚酰亚胺薄膜。卤化聚酰亚胺薄膜在波长为 1 550 纳米时的折射率为 1.520 或更低。此外，光波导使用卤化聚酰亚胺薄膜作为芯层和铠装层中的至少一层，光波导的芯层和铠装层之间的相对折射率差为 0.6 或更大。光波导设备包含这样的光波导。
• ENERGY-SENSITIVE RESIN COMPOSITION
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP3275940A1

  公开（公告）日：2018-01-31

  The present invention provides an energy-sensitive resin composition with which it is possible, even if the precursor polymer is heat-treated at low temperatures, to produce a film or molded article comprising an imide ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance with a low dielectric constant, or a film or molded article comprising an oxazole ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance. Also provided are a method of manufacturing the film or molded article; a method of forming a pattern using the energy-sensitive resin composition; and a permanent film having excellent heat resistance, tensile elongation and chemical resistance. The energy-sensitive resin composition comprises an imidazole compound (A) represented by formula (1a), a resin precursor component (B), and a solvent (S), wherein the resin precursor component (B) is at least one resin precursor component selected from the group consisting of: a monomer component comprising a diamine compound represented by formula (2), a dicarbonyl compound represented by formula (3a) and/or a tetracarboxylic acid dianhydride represented by formula (3b); and a precursor polymer having a repeating unit represented by formula (4).

  本发明提供了一种能量敏感树脂组合物，使用该组合物，即使在低温下对前体聚合物进行热处理，也可以生产出一种薄膜或模塑制品，该薄膜或模塑制品由具有优异耐热性、拉伸伸长率和耐化学性且介电常数较低的含亚胺环聚合物组成，或由具有优异耐热性、拉伸伸长率和耐化学性的含恶唑环聚合物组成。此外，还提供了一种制造薄膜或模塑品的方法；一种使用能量敏感树脂组合物形成图案的方法；以及一种具有优异耐热性、拉伸伸长率和耐化学性的永久性薄膜。能敏树脂组合物包括由式 (1a) 表示的咪唑化合物 (A)、树脂前体组分 (B) 和溶剂 (S)，其中树脂前体组分 (B) 是至少一种选自以下组别的树脂前体组分：由式（2）代表的二胺化合物、式（3a）代表的二羰基化合物和/或式（3b）代表的四羧酸二酐组成的单体组分；以及具有式（4）代表的重复单元的前体聚合物。