3-Methoxy-3-methylpentane | 53273-16-8

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-Methoxy-3-methylpentane
• CAS: 53273-16-8
• 化学式: C₇H₁₆O
• 分子量: 116.2
• InChiKey: KRISPYQCCVEVFA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• Method for the production of beta-ketonitriles
  申请人：Vogelbacher Uwe Josef

  公开号：US20100105903A1

  公开（公告）日：2010-04-29

  The present invention relates to a process for preparing β-ketonitriles of the general formula I in which R 1 is, inter alia, C 1 -C 12 -alkyl, C 2 -C 12 -alkenyl, C 2 -C 12 -alkinyl, C 3 -C 8 -cycloalkyl, C 3 -C 8 -cycloalkyl-C 1 -C 4 -alkyl, phenyl-C 1 -C 4 -alkyl, phenoxy-C 1 -C 4 -alkyl or benzyloxy-C 1 -C 4 -alkyl; R 2 is, inter alia, hydrogen, C 1 -C 12 -alkyl, C 2 -C 12 -alkenyl, C 2 -C 12 -alkinyl, C 3 -C 8 -cycloalkyl, C 3 -C 8 -cycloalkyl-C 1 -C 4 -alkyl, phenyl, phenyl-C 1 -C 4 -alkyl, phenoxy-C 1 -C 4 -alkyl or benzyloxy-C 1 -C 4 -alkyl, which comprises reacting a nitrile of the formula II in which R 1 has one of the meanings given above with a carboxylic ester of the formula III in which R 2 has one of the meanings given above and R 3 is C 1 -C 12 -alkyl, C 1 -C 4 -alkoxy-C 1 -C 4 -alkyl, C 3 -C 8 -cycloalkyl, C 3 -C 8 -cycloalkyl-C 1 -C 4 -alkyl, phenyl-C 1 -C 4 -alkyl, phenoxy-C 1 -C 4 -alkyl or benzyloxy-C 1 -C 4 -alkyl, where the reaction is carried out in the presence of a potassium alkoxide and at least 80% of the nitrile of the formula II are added to the reaction under reaction conditions.

  本发明涉及一种制备一般式I的β-酮腈的方法，其中R1是C1-C12-烷基、C2-C12-烯基、C2-C12-炔基、C3-C8-环烷基、C3-C8-环烷基-C1-C4-烷基、苯基-C1-C4-烷基、苯氧基-C1-C4-烷基或苄氧基-C1-C4-烷基；R2是氢、C1-C12-烷基、C2-C12-烯基、C2-C12-炔基、C3-C8-环烷基、C3-C8-环烷基-C1-C4-烷基、苯基、苯基-C1-C4-烷基、苯氧基-C1-C4-烷基或苄氧基-C1-C4-烷基。该方法包括将具有上述给定含义之一的一般式II的腈与具有上述给定含义之一的一般式III的羧酸酯反应，其中R3是C1-C12-烷基、C1-C4-烷氧基-C1-C4-烷基、C3-C8-环烷基、C3-C8-环烷基-C1-C4-烷基、苯基-C1-C4-烷基、苯氧基-C1-C4-烷基或苄氧基-C1-C4-烷基，在存在钾醇和至少80%的一般式II的腈被加入到反应中，并在反应条件下进行。
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION
  申请人：FUJIFILM CORP

  公开号：WO2010035905A1

  公开（公告）日：2010-04-01

  An actinic ray-sensitive or radiation-sensitive resin composition comprising any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)?2- and OS(=O)2-, provided that -C(=O)O- is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.

  一种光化学射线敏感性或辐射敏感性树脂组合物，包括下面的通式(I)中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团之外的取代基的芳香环；n为大于等于1的整数；A代表从单键、烷基基团、-O-、-S-、-C(=O)-、-S(=O)-、-S(=O)2-和OS(=O)2-中选取的任意一个或两个以上成员的组合，但不包括-C(=O)O-；B代表含有4个或更多碳原子的烃基团的基团，当n大于等于2时，两个或更多个-(A-B)基团可以相同或不同；M+代表有机离子。
• MOLECULARLY IMPRINTED POLYMERS, METHODS FOR THEIR PRODUCTION AND USES THEREOF
  申请人：Hearn Milton T.W.

  公开号：US20120225962A1

  公开（公告）日：2012-09-06

  The present invention relates to methods of preparing molecularly imprinted polymers (MIPs) which facilitate chemical hydrolysis and more particularly the hydrolysis of chemical substrates which possess hydrolytically labile bonds such as peptides and proteins. The present invention is thus directed to MIPs designed to possess hydrolytic activity, methods for preparing such MIPs and uses of the MIPs.

  本发明涉及制备分子印迹聚合物（MIPs）的方法，该方法促进化学水解，更具体地，促进具有水解敏感键的化学底物（例如肽和蛋白质）的水解。因此，本发明针对设计具有水解活性的MIPs，制备这种MIPs的方法以及MIPs的用途。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION
  申请人：TSUCHIMURA Tomotaka

  公开号：US20110171577A1

  公开（公告）日：2011-07-14

  An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O) 2 — and —OS(═O) 2 —, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M + represents an organic onium ion.

  一种感光射线敏感或辐射敏感的树脂组合物包括下列通式（I）中的任何一种化合物；其中：Ar代表可能具有除了-(A-B)基团以外的取代基的芳香环；n是大于等于1的整数；A代表从单键、烷基、—O—、—S—、—C（═O）—、—S（═O）—、—S（═O）2—和—OS（═O）2—中任意选择一个或两个或两个以上成员的组合，但不包括—C（═O）O—；B代表一个含有4个或更多碳原子的烃基团，其中包含一个三级或季级碳原子，当n大于等于2时，两个或两个以上的-(A-B)基团可以相同或不同；M+代表有机阳离子。
• A process for the production of tertiary olefin
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP0045159A1

  公开（公告）日：1982-02-03

  A tertiary olefin is produced by making a gaseous tertiary ether usually represented by the following general formula: wherein R1, R2 and R3 are alkyl groups each having 1-4 carbon atoms which may be same or different each other and R4 is an alkyl group having 1-3 carbon atoms, contact a catalyst obtained by calcining a silica-alumina compound at 700-1100°C in order to carry out cracking of the tertiary ether.

  将通常由以下通式表示的气态叔醚与催化剂接触，生产叔烯烃： 其中 R1、R2 和 R3 分别为具有 1-4 个碳原子的烷基，它们之间可以相同或不同，R4 为具有 1-3 个碳原子的烷基，将通过在 700-1100°C 煅烧二氧化硅-氧化铝化合物获得的催化剂与之接触，以进行叔醚裂解。