申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0189272A2
公开(公告)日:1986-07-30
The present invention provides compounds of the general formula:
wherein R1 is a hydroxyl or protected hydroxyl group or a carboxyl group or a lower alkoxycarbonyl or benzyloxy radical, R2 is a hydrogen or halogen atom or a halo(lower)alkyl radical, R3 is a hydrogen atom, a hydroxyl group or a lower alkoxy radical and A is a lower alkylene radical; and the pharmaceutically acceptable salts thereof.
The present invention also provides processes for the preparation of these compounds and pharmaceutical compositions containing them and is also concerned with the use thereof.
本发明提供通式如下的化合物:其中 R1 是羟基或受保护羟基或羧基或低级烷氧基羰基或苄氧基基团,R2 是氢原子或卤素原子或卤代(低级)烷基基团,R3 是氢原子、羟基或低级烷氧基基团,A 是低级亚烷基基团;以及它们的药学上可接受的盐;本发明还提供制备这些化合物和含有它们的药物组合物的工艺,并涉及它们的用途。