2-[2-(2-戊氧基乙氧基)乙氧基]乙醇 | 25961-91-5

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 2-[2-(2-戊氧基乙氧基)乙氧基]乙醇
• 英文名称: triethylene glycol monopentyl ether
• 英文别名: triethylene glycol pentyl ether；n-Pentyl-triethylen-glykolether；O-n-Amyl-triethylenglykol；2-[2-(2-pentyloxy-ethoxy)-ethoxy]-ethanol；2-[2-(2-Pentoxyethoxy)ethoxy]ethanol
• CAS: 25961-91-5
• 化学式: C₁₁H₂₄O₄
• mdl: MFCD00077951
• 分子量: 220.309
• InChiKey: PLLUGRGSPQYBKB-UHFFFAOYSA-N

物化性质

• 密度：
  0.971 g/mL at 20 °C
• 闪点：
  96 °C
• 保留指数：
  1578.8

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  15
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  47.9
• 氢给体数：
  1
• 氢受体数：
  4

安全信息

• 海关编码：
  2909499000

反应信息

• 作为产物：
  描述：

  1-溴戊烷 、 三乙二醇 在 sodium hydride 作用下， 生成 2-[2-(2-戊氧基乙氧基)乙氧基]乙醇
  参考文献：
  名称：

  局部驱蚊剂VII：烷基三乙二醇单醚

  摘要：

  三甘醇的正链和支链脂族单醚是有效的局部驱蚊剂。就保护的持续时间而言，它们通常优于相应的二甘醇类似物，并且一些优于二乙基甲苯酰胺。三乙二醇的正庚基单醚在受控实验室条件下提供了两倍的二乙基甲苯酰胺保护时间，并且似乎是一种有用的新型驱蚊剂。

  DOI：

  10.1002/jps.2600640428

文献信息

• Enol ethers
  申请人：Eastman Chemical Company

  公开号：US10889536B1

  公开（公告）日：2021-01-12

  Disclosed are enol ethers compounds. The enol ethers exhibit low volatile organic content and are useful in a variety of chemical applications. The enol ethers can be used in applications as diluents, wetting agents, coalescing aids, paint additives and as intermediates in chemical processes. The enol ethers also have particular utility as film-hardening additives in coating formulations.

  披露了烯醇醚化合物。这些烯醇醚具有低挥发性有机成分，并且在各种化学应用中很有用。这些烯醇醚可以用作稀释剂、润湿剂、凝聚助剂、涂料添加剂以及化学过程中的中间体。这些烯醇醚在涂料配方中还具有特殊的用途，可作为硬化膜添加剂。
• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210286266A1

  公开（公告）日：2021-09-16

  The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

  本发明是一种用于形成有机薄膜的材料，包括：由以下通用式（1）所示的化合物；和有机溶剂，在通用式（1）中，X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团，“n”表示1到10的整数，R1独立地表示以下通用式（2）中的任何一种，其中在通用式（2）中，虚线表示连接点到X，Q1表示含有羰基的一价有机基团，其中至少部分是以下通用式（3）所示的基团，其中在通用式（3）中，虚线表示连接点，X1表示单键或具有1到20个碳原子的二价有机基团，在有机基团具有芳香环时可选地具有取代基，R2表示氢原子、甲基基团、乙基基团或苯基团，**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料，同时具有高填充和平整化性能以及对基底的粘附性。
• LOW VISCOSITY LOW VOLATILITY LUBRICATING OIL BASE STOCKS AND METHODS OF USE THEREOF
  申请人：ExxonMobil Research and Engineering Company

  公开号：US20170183595A1

  公开（公告）日：2017-06-29

  A lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein. The lubricating oil base stock has a high temperature high shear (HTHS) viscosity of less than about 1.7 cP as determined by ASTM D4683, and a Noack volatility from about 15 to about 90 percent as determined by ASTM D5800. A lubricating oil containing the lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein. A method for improving one or more of thermal and oxidative stability, solubility and dispersancy of polar additives, deposit control and traction control in a lubricating oil by using as the lubricating oil a formulated oil containing the lubricating oil base stock including one or more monoesters represented by the formula (I), (II), (III) and (IV) as defined herein.

  一种润滑油基础油，包括根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯。该润滑油基础油的高温高剪切（HTHS）粘度小于约1.7厘泊，由ASTM D4683确定，挥发性从约15%到约90%，由ASTM D5800确定。一种含有根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯的润滑油基础油的润滑油。一种通过使用包含根据本文所定义的公式(I)、(II)、(III)和(IV)表示的一个或多个单酯的润滑油基础油的配制油来改善润滑油中的热稳定性、氧化稳定性、溶解性和分散性、沉积控制和牵引控制的方法。
• COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170184968A1

  公开（公告）日：2017-06-29

  A compound for forming an organic film shown by the formula (1A), R—(—X) m1 (1A) wherein R represents a single bond or an organic group having 1 to 50 carbon atoms; X represents a group shown by formula (1B); and ml represents an integer satisfying 2≦m1≦10, wherein X 2 represents a divalent organic group having 1 to 10 carbon atoms; n1 represents 0 or 1; n2 represents 1 or 2; X 3 represents a group shown by the formula (1C); and n5 represents 0, 1, or 2, wherein R 10 represents a hydrogen atom or a saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms, wherein a hydrogen atom of the benzene ring in formula (1C) may be substituted with a methyl group or methoxy group. This compound for forming an organic film can provide organic film composition having good dry etching resistance, heat resistance to 400° C. or higher, high filling and planarizing properties.

  一种用于形成有机薄膜的化合物，其化学式为(1A)，R—(—X)m1(1A)，其中R代表一个单键或具有1至50个碳原子的有机基团；X代表化学式(1B)所示的基团；m1代表满足2≦m1≦10的整数，其中X2代表具有1至10个碳原子的二价有机基团；n1代表0或1；n2代表1或2；X3代表化学式(1C)所示的基团；n5代表0、1或2，其中R10代表氢原子或具有1至10个碳原子的饱和或不饱和碳氢基团，化学式(1C)中苯环的氢原子可能被甲基基团或甲氧基取代。这种用于形成有机薄膜的化合物可以提供具有良好干法刻蚀抗性、耐高温至400°C或更高、高填充和平整化性能的有机薄膜组合物。
• RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210397092A1

  公开（公告）日：2021-12-23

  A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH 2 ) p —; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R 01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

  多层光刻法中使用的抗蚀底层膜材料包含以下通式（1）所示的化合物（A）和有机溶剂（B），其中X独立地表示由以下通式（2）所示的一价有机基团；W包含“m”个部分结构，每个部分结构都独立地由以下式（3）所示；“m”和“n”分别表示1到10的整数；断裂的线表示连接臂；Z表示芳香基团；A表示单键或—O—（CH2）p—；“k”表示1到5的整数；“p”表示1到10的整数；R01表示氢原子或具有1到10个碳原子的一价有机基团。该材料能够形成在半导体器件制造过程中通过多层光刻法具有平坦化性能的抗蚀底层膜，以及用于形成抗蚀底层膜的图案化过程和方法。