申请人:Hoffmann-La Roche Inc.
公开号:US05420129A1
公开(公告)日:1995-05-30
The invention is concerned with novel sulphonamides and their use as medicaments. In particular, the invention is concerned with compounds of the formula ##STR1## wherein R.sup.1 is hydrogen, lower-alkyl, lower-alkoxy, lower-alkylthio, halogen or trifluoromethyl; R.sup.2 is hydrogen, lower-alkyl, halogen, lower-alkoxy, trifluoromethyl or --OCH.sub.2 COOR.sup.9 ; R.sup.3 is hydrogen, lower-alkyl, halogen, lower-alkylthio, trifluoromethyl, lower-alkoxy or trifluoromethoxy; R.sup.2 and R.sup.3 together are butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; R.sup.4 is hydrogen, lower-alkyl, trifluoromethyl, lower-alkoxy, lower-alkylthio, hydroxy-lower-alkyl, hydroxy-lower-alkoxy, hydroxy-lower-alkoxy-lower-alkyl, hydroxy-lower-alkoxy-lower-alkoxy, alkoxy-lower-alkyl, alkoxy-lower-alkyloxy, lower-alkylsulfinyl, lower-alkylsulfonyl, 2-methoxy-3-hydroxypropoxy, 2-hydroxy-3-phenylpropyl, amino-lower-alkyl, lower-alkylamino-lower-alkyl, di-lower-alkylamino-lower-alkyl, amino, lower-alkylamino, di-lower-alkylamino, arylamino, aryl, arylthio, aryloxy, aryl-lower-alkyl, heterocyclyl, heterocyclo-lower-alkyl, heterocyclylamino, heterocyclylthio, heterocyclyloxy, --CHO, --CH.sub.2 OH or --CH.sub.2 Cl; R.sup.5 to R.sup.8 are independently hydrogen, halogen, trifluoromethyl, lower-alkoxy, lower-alkylthio or cyano; R.sup.6 and R.sup.5 or R.sup.7 together are butadienyl, methylene-dioxy, ethylenedioxy or isopropylidenedioxy; X is --O-- or --S--; Y is --CHO, C.sub.1-4 -alkyl, --(CH.sub.2).sub.1-4 --Z--R.sup.9, --(CH.sub.2).sub.1-4 --OC(O)(CH.sub.2).sub.1-4 CH.sub.3, --(CH.sub.2).sub.1-4 OC(O)Het, --(CH.sub.2).sub.1-4 NHC(O)R.sup.10, --(CH.sub.2).sub.1-4 OCH.sub.2 CH(OH)CH.sub.2 OH and cyclic ketals thereof, --(CH.sub.2).sub.1-4 NR.sup.9 CH.sub.2 CH(OH)CH.sub.2 OH, --(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 SCH.sub.3, --(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 S(O)CH.sub.3, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 --Z H, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)R.sup.10, --(CH.sub.2).sub.1-4 NR.sup.9 (CH.sub.2).sub.1-4 Z H, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)Het, --(CH.sub.2).sub.0-3 CH(OH)R.sup.10, --(CH.sub.2).sub.0-3 CH(OH)(CH.sub.2).sub.1-4 Z H, --(CH.sub.2).sub.0-3 CH(OH)CH.sub.2 SCH.sub.3, --(CH.sub.2).sub.0-3 CH(OH)CH.sub. 2 S(O)CH.sub.3, --(CH.sub.2).sub.0-3 CH(OH)OCH.sub.2 CH.sub.2 OH, --(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 CH.sub.3, --(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 Z R.sup.11, --(CH.sub.2).sub.0-3 C(O)CH.sub.2 Hal, --(CH.sub.2).sub.1-4 Hal, --(CH.sub.2).sub.1-4 CN, --(CH.sub.2).sub.0-3 C(O)OR.sup.9, --OR.sup.12 or --SR.sup.12 ; R.sup.9 is hydrogen or C.sub.1-4 -alkyl; R.sup.10 is C.sub.1-4 -alkyl; R.sup.11 is hydrogen, C.sub.1-4 -alkanoyl or heterocyclylcarbonyl; R.sup.12 is C.sub.1-4 -alkyl or --(CH.sub.2).sub.0-4 -aryl; Z is --O--, --S-- or --NR.sup.9 --; Het is a heterocyclic residue; Hal is halogen; and n is 0 or 1; and salts thereof.
该发明涉及新型磺酰胺及其作为药物的用途。特别是,该发明涉及式中化合物:其中R1为氢、低烷基、低烷氧基、低烷硫基、卤素或三氟甲基;R2为氢、低烷基、卤素、低烷氧基、三氟甲基或-OCH2COOR9;R3为氢、低烷基、卤素、低烷硫基、三氟甲基、低烷氧基或三氟甲氧基;R2和R3一起为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;R4为氢、低烷基、三氟甲基、低烷氧基、低烷硫基、羟基-低烷基、羟基-低烷氧基、羟基-低烷氧基-低烷基、羟基-低烷氧基-低烷氧基、烷氧-低烷基、烷氧-低烷氧基、低烷基亚砜基、低烷基磺酰基、2-甲氧基-3-羟基丙氧基、2-羟基-3-苯基丙基、氨基-低烷基、低烷基氨基-低烷基、二-低烷基氨基-低烷基、氨基、低烷基氨基、二-低烷基氨基、芳基氨基、芳基、芳硫基、芳基氧基、芳基-低烷基、杂环基、杂环基-低烷基、杂环基氨基、杂环基硫基、杂环基氧基、--CHO、--CH2OH或--CH2Cl;R5到R8分别为氢、卤素、三氟甲基、低烷氧基、低烷硫基或氰基;R6和R5或R7一起为丁二烯基、亚甲二氧基、乙二氧基或异丙基亚甲基二氧基;X为--O--或--S--;Y为--CHO、C1-4-烷基、--(CH2)1-4--Z--R9、--(CH2)1-4--OC(O)(CH2)1-4CH3、--(CH2)1-4OC(O)Het、--(CH2)1-4NHC(O)R10、--(CH2)1-4OCH2CH(OH)CH2OH及其环状缩酮、--(CH2)1-4NR9CH2CH(OH)CH2OH、--(CH2)1-4OCH2CH2SCH3、--(CH2)1-4OCH2CH2S(O)CH3、--(CH2)1-4O(CH2)1-4--ZH、--(CH2)1-4O(CH2)1-4OC(O)R10、--(CH2)1-4NR9(CH2)1-4ZH、--(CH2)1-4O(CH2)1-4OC(O)Het、--(CH2)0-3CH(OH)R10、--(CH2)0-3CH(OH)(CH2)1-4ZH、--(CH2)0-3CH(OH)CH2SCH3、--(CH2)0-3CH(OH)CH2S(O)CH3、--(CH2)0-3CH(OH)OCH2CH2OH、--(CH2)0-3C(O)(CH2)1-4CH3、--(CH2)0-3C(O)(CH2)1-4ZR11、--(CH2)0-3C(O)CH2Hal、--(CH2)1-4Hal、--(CH2)1-4CN、--(CH2)0-3C(O)OR9、--OR12或--SR12;R9为氢或C1-4-烷基;R10为C1-4-烷基;R11为氢、C1-4-烷酰基或杂环基羰基;R12为C1-4-烷基或--(CH2)0-4-芳基;Z为--O--、--S--或--NR9--;Het为杂环残基;Hal为卤素;n为0或1;以及其盐。