申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020132970A1
公开(公告)日:2002-09-19
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH
2
)
m
— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
新颖的乙缩醛化合物,其中5-或6-成员环乙缩醛结构通过一个连接基团(表示为—(CH2)m—,其中一个氢原子可以被羟基或乙酰氧基取代,m为1至8)连接到诺博烯结构上。使用乙缩醛化合物作为单体,可以获得聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射具有敏感性,并具有优异的敏感性、分辨率和蚀刻抗性。