申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20140242519A1
公开(公告)日:2014-08-28
A polymer for resist use is obtainable from a monomer having formula (1) wherein R
1
is H, CH
3
or CF
3
, R
2
and R
3
are a monovalent hydrocarbon group, R
4
to R
9
are hydrogen or a monovalent hydrocarbon group, R
10
is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A
1
is a divalent hydrocarbon group, k
1
is 0 or 1, and n
1A
is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.