2-甲基-4,6-二(壬基)苯酚 | 3011-61-8

• 物质功能分类: 有机原料 - 醇、酚、酚醇类化合物及衍生物 - 酚及其卤化、磺化、硝化或亚硝化衍生物
• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 中文名称: 2-甲基-4,6-二(壬基)苯酚
• 中文别名: 丁基16-甲基十七烷酸酯
• 英文名称: 4,6-Dinonyl-o-cresol
• 英文别名: 2-methyl-4,6-di(nonyl)phenol
• CAS: 3011-61-8
• 化学式: C₂₅H₄₄O
• 分子量: 360.624
• InChiKey: SGHSRBYSXCNJLP-UHFFFAOYSA-N

物化性质

• 沸点：
  200-220 °C(Press: 10 Torr)
• 密度：
  0.899±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  11.1
• 重原子数：
  26
• 可旋转键数：
  16
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.76
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

安全信息

• 海关编码：
  2907199090

文献信息

• Catalyst composition for hydrogenation and method for hydrogenation using the same
  申请人：Asahi Kasei Chemicals Corporation

  公开号：US10016749B2

  公开（公告）日：2018-07-10

  A catalyst composition for hydrogenation including (A) to (D), in which a mass ratio ((C)/(A)) is 0.1 to 4.0 and a mass ratio ((D)/(A)) is 0.01 to 1.00, (A): a titanocene compound represented by formula (1), (wherein R5 and R6 are any group selected from hydrogen, a hydrocarbon group having 1 to 12 carbon atoms, an aryloxy group, an alkoxy group, a halogen group, and a carbonyl group. R1 and R2 are any group selected from the group consisting of hydrogen and a hydrocarbon group having 1 to 12 carbon atoms, and R1 and R2 are not all hydrogen atoms or all a hydrocarbon group having 1 to 12 carbon atoms), (B): a reductant formed from a compound containing an element selected from the elements Li, Na, K, Mg, Zn, Al, and Ca, (C): an unsaturated compound having a molecular weight of 400 or less, and (D): a polar compound.

  一种用于加氢的催化剂组合物，包括(A)至(D)，其中质量比((C)/(A))为0.1至4.0，质量比((D)/(A))为0.01至1.00， (A)：由公式(1)表示的钛环戊二烯基化合物， （其中R5和R6是从氢、具有1至12个碳原子的烃基、芳氧基、烷氧基、卤素基和羰基中选择的任何基团。R1和R2是从氢和具有1至12个碳原子的烃基组成的组中选择的任何基团，且R1和R2不全是氢原子或全部为具有1至12个碳原子的烃基）， (B)：由含有选自Li、Na、K、Mg、Zn、Al和Ca元素的化合物的还原剂形成， (C)：分子量400或以下的非饱和化合物，以及 (D)：极性化合物。
• POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：Tsuchihashi Toru

  公开号：US20100248146A1

  公开（公告）日：2010-09-30

  A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R 1 independently represents hydrogen or a methyl group, R 2 represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.

  一种正性光刻胶组合物，包括(A)一种树脂，该树脂包含由公式(I)至(III)表示的所有重复单元，并通过酸的作用在碱性显影剂中变得可溶，以及(B)一种能够在光刻射线或辐射照射下产生酸的化合物；以及使用该组合物的图案形成方法。其中，A表示通过酸的作用分解并离开的基团，每个R1独立地表示氢或甲基基团，R2表示苯基或环己基，m表示1或2，n表示0至2的整数。由于这种构造，提供了一种光刻胶组合物，确保高分辨率、良好的图案轮廓、足够的焦深度、开发后几乎没有缺陷以及足够高的等离子体刻蚀抗性。
• CROSSLINKABLE POLYMERS AND UNDERLAYER COMPOSITIONS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150210793A1

  公开（公告）日：2015-07-30

  A crosslinkable polymer comprising: a first unit of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; X 1 is a monovalent electron donating group; X 2 is a divalent electron donating group; Ar 1 and Ar 2 are trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Ar 1 or Ar 2 ; m and n are each an integer of 1 or more; and each R 1 is independently a monovalent group; and a second unit chosen from general formulae (III) and (IV): wherein R 7 is chosen from hydrogen, fluorine, C 1 -C 3 alkyl and C 1 -C 3 fluoroalkyl, R 8 is chosen from optionally substituted C 1 to C 10 alkyl, and Ar 3 is an optionally substituted aryl group. Underlayer compositions comprise the crosslinkable polymer and a solvent. The crosslinkable polymers and underlayer compositions find particular applicability in the manufacture of semiconductor devices or data storage devices for the formation of high resolution patterns.

  一种可交联聚合物，包括以下第一单元的一般式(I-A)或(I-B)：其中：P是聚合官能团；L是单键或m+1价连接基团；X1是单价电子供体基团；X2是双价电子供体基团；Ar1和Ar2分别是三价和二价芳基基团，环丁烯环上的碳原子与Ar1或Ar2的同一芳环上的相邻碳原子相键合；m和n均为1或更多的整数；每个R1独立地是单价基团；以及从一般式(III)和(IV)中选择的第二单元：其中R7选择自氢、氟、C1-C3烷基和C1-C3氟烷基，R8选择自可选取代的C1至C10烷基，而Ar3是可选取代的芳基基团。底层组成物包括可交联聚合物和溶剂。该可交联聚合物和底层组成物在制造半导体器件或数据存储器件的高分辨率图案形成中具有特定的适用性。
• UV-light-stabilized compositions containing substituted 1,5-diazacycloalkanes and 2-keto-1,5-diazacycloalkanes, novel compounds and synthesis thereof
  申请人：The B.F. GOODRICH Company

  公开号：EP0001560A2

  公开（公告）日：1979-05-02

  Novel polysubstituted 1,5-diazacycloalkanes and polysubstituted 2-keto-1,5- diazcycloalkanes are powerful stabilizers for materials subject to ultraviolet (UV) light degradation, particularly for polyolefins. The cyclic compounds of this invention have (a) a fixed three-carbon bridge between the N' and N5 atoms of the diaza ring, the remaining portion of the ring having a variable length bridge of two or more carbon stoms, (b) an N-adjacent carbon atom of the diaza ring is polysubstituted, that is, has two substituents which may be cyclizable. Compositions containing (a) the polysubstituted 1,5-diazacycloalkanes and polysubstituted 2-keto-1,5- diazacycloalkanes of this invention, and (b) prior art polysubstituted 1,5-diazacycloalkanes and polysubstituted 2-keto-1,5-diazscycloalkanes, exhibit excellent stability to UV light. A novel synthesis for preparing polysubstituted 2- keto-1,5- diazacycloalkanes is disclosed.

  新颖的多取代 1,5-二氮环烷和多取代 2-酮基-1,5-二氮环烷是紫外线（UV）降解材料的强力稳定剂，尤其适用于聚烯烃。本发明的环状化合物(a)在重氮环的 N'和 N5 原子间有一个固定的三碳桥，环的其余部分有一个由两个或多个碳原子组成的长度可变的桥，(b)重氮环的一个 N 相邻碳原子是多取代的，即有两个可环化的取代基。 含有 (a) 本发明的多取代 1,5-二氮杂环烷烃和多取代 2-酮基-1,5-二氮杂环烷烃，以及 (b) 现有技术中的多取代 1,5-二氮杂环烷烃和多取代 2-酮基-1,5-二氮杂环烷烃的组合物，对紫外线具有极佳的稳定性。 本发明公开了一种制备多取代 2-酮基-1,5-重氮环烷的新型合成方法。
• UV-light stabilized compositions containing substituted 2-keto-1,4-diazacycloalkanes
  申请人：The B.F. GOODRICH Company

  公开号：EP0001284A1

  公开（公告）日：1979-04-04

  Novel polysubstituted 2-keto-1,4- diazacycloalkanes are powerful stabilizers for materials subject to ultraviolet (UV) light degradation, particularly for polyolefins. The cyclic 2-keto compounds of this invention have (a) a fixed two-carbon bridge between the N'and N4 atoms of the diaza ring, the remaining portion of the ring having a variable length bridge of two or more carbon atoms, (b) an N-adjacent carbonyl in the fixed two-carbon bridge, and (c) at least one N4-adjacent carbon atom of the diaza ring is polysubstituted, that is, has two substituents which may be cyclizable. Compositions containing (a) the polysubstituted 2- keto-1,4- diazacycloalkanes of this invention, and (b) prior art polysubstituted 2-keto-1,4- diazacycloalkanes, exhibit excellent stability to UV light.

  新型多取代 2-酮基-1,4-重氮环烷是紫外线（UV）降解材料的强力稳定剂，尤其适用于聚烯烃。本发明的环状 2-Keto 化合物具有：(a)重氮环的 N'原子和 N4 原子间有一个固定的双碳桥，环的其余部分有一个由两个或两个以上碳原子组成的长度可变的桥；(b)在固定的双碳桥中有一个 N 相邻的羰基；(c)重氮环中至少有一个 N4 相邻的碳原子是多取代的，即有两个可环化的取代基。 含有(a)本发明的多取代 2-酮基-1,4-二氮杂环烷烃和(b)现有技术中的多取代 2-酮基-1,4-二氮杂环烷烃的组合物对紫外线具有极佳的稳定性。