3-methyl-hexahydro-cyclopenta[b]furan-2-one | 40556-75-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3-methyl-hexahydro-cyclopenta[b]furan-2-one
• 英文别名: 2H-Cyclopenta[b]furan-2-one, hexahydro-3-methyl-；3-methyl-3,3a,4,5,6,6a-hexahydrocyclopenta[b]furan-2-one
• CAS: 40556-75-0
• 化学式: C₈H₁₂O₂
• 分子量: 140.182
• InChiKey: FOQITWZHLMJJRK-UHFFFAOYSA-N

物化性质

• 沸点：
  254.0±8.0 °C(Predicted)
• 密度：
  1.074±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-(1-羟基-环戊基)-丙酸 、 硫酸 以84%的产率得到
  参考文献：
  名称：

  WATANABE SHOJI; FUJITA TSUTOMU; SUGA KYOICHI; ISOBE TOSHIO; MIURA TOSHIRO+, YUKAGAKU, YUKAGAKU, J. JAR. OIL CHEM. SOS., 1980, 29, NO 1, 43-48

  摘要：

  DOI：

文献信息

• RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200159119A1

  公开（公告）日：2020-05-21

  A resist composition including a structural unit represented by General Formula (a0-1), a structural unit containing a cyclic group in which —O—C(═O)— forms a part of a ring skeleton (excluding a cyclic group forming a cross-linked structure), and a structural unit represented by General Formula (a0-3); in the General Formula (a0-1), Rx 01 is an acid dissociable group represented by General Formula (a01-r-1) or General Formula (a01-r-2); in the Formula (a01-r-1) and Formula (a01-r-2), Xa and Ya, and Xaa and Yaa are groups that together form an aliphatic cyclic group that does not have a cross-linked structure; in General Formula (a0-3), Ya x3 is a single bond or an (n ax3 +1)-valent linking group.
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AU RAYON ACTINIQUE OU SENSIBLE AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIF L'UTILISANT
  申请人：FUJIFILM CORP

  公开号：WO2010114107A1

  公开（公告）日：2010-10-07

  An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass% based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
• WATANABE SHOJI; FUJITA TSUTOMU; SUGA KYOICHI; ISOBE TOSHIO; MIURA TOSHIRO+, YUKAGAKU, YUKAGAKU, J. JAR. OIL CHEM. SOS., 1980, 29, NO 1, 43-48
  作者：WATANABE SHOJI、 FUJITA TSUTOMU、 SUGA KYOICHI、 ISOBE TOSHIO、 MIURA TOSHIRO+

  DOI：——

  日期：——