申请人:Hoechst-Roussel Pharmaceuticals, Inc.
公开号:US04794110A1
公开(公告)日:1988-12-27
There are disclosed compounds of the formula, ##STR1## where X and Y are each independently hydrogen, loweralkyl, halogen or trifluoromethyl; Z is hydrogen or 2- or 3-Cl, Br, I, CHO or CH.dbd.CR.sub.1 R.sub.2 where R.sub.1 and R.sub.2 are each independently hydrogen or loweralkyl; R is hydrogen, --(CH.sub.2).sub.n NR.sub.3 R.sub.4 or ##STR2## where n is 1, 2 or 3, R.sub.3 is loweralkyl, and R.sub.4 is hydrogen or loweralkyl, or alternatively the group --NR.sub.3 R.sub.4 as a whole is ##STR3## where R.sub.6 is loweralkyl, ##STR4## and R.sub.7 is loweralkyl or ##STR5## R.sub.8 being hydrogen, loweralkyl, halogen, trifluoromethyl or methoxy; and R.sub.5 is hydrogen, loweralkyl or arylloweralkyl.
已披露的化合物的结构式如下:##STR1## 其中 X 和 Y 分别独立地为氢、较低的烷基、卤素或三氟甲基;Z 为氢或2-或3-Cl、Br、I、CHO或CH.dbd.CR.sub.1 R.sub.2,其中 R.sub.1 和 R.sub.2 分别独立地为氢或较低的烷基;R 为氢、--(CH.sub.2).sub.n NR.sub.3 R.sub.4 或##STR2## 其中 n 为1、2或3,R.sub.3 为较低的烷基,R.sub.4 为氢或较低的烷基,或者作为一个整体的基团--NR.sub.3 R.sub.4 为##STR3## 其中 R.sub.6 为较低的烷基,##STR4## 而 R.sub.7 为较低的烷基或##STR5## R.sub.8 为氢、较低的烷基、卤素、三氟甲基或甲氧基;R.sub.5 为氢、较低的烷基或芳基较低的烷基。