1-hydroxybicyclo<3.3.1>nonane | 37392-59-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-hydroxybicyclo<3.3.1>nonane
• 英文别名: 1-Noradamantanol；1-Hydroxy-noradamantan；Tricyclo[3.3.1.03,7]nonan-1-ol；tricyclo[3.3.1.03,7]nonan-1-ol
• CAS: 37392-59-9
• 化学式: C₉H₁₄O
• 分子量: 138.21
• InChiKey: VJJZDEWRLPQXFL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-hydroxybicyclo<3.3.1>nonane 在 三溴化磷 作用下， 生成 1-Bromnoradamantan
  参考文献：
  名称：

  Syntheses in the noradamantane series

  摘要：

  DOI：

  10.1021/jo00943a026
• 作为产物：
  描述：

  hexahydro-2,5-methano-pentalene 在 氧气 、 硝酸 、 三氟乙酸 、 potassium hydroxide 作用下， 以 乙醇 为溶剂， 反应 7.5h， 以45%的产率得到1-hydroxybicyclo<3.3.1>nonane
  参考文献：
  名称：

  一种包含多环烷烃的芳香族衍生物及包含该 衍生物的有机电致发光器件

  摘要：

  本发明涉及一种包含多环烷烃的芳香族衍生物及包含该衍生物的有机电致发光器件，结构如下化学式Ⅰ所示：本发明化合物是包含多环烷烃为骨架的芳香族衍生物，呈现出优良的稳定性和高耐热性；能够大幅减少能量损失，能够形成稳定的稠环。本发明包含多环烷烃的芳香族衍生物能够提高有机电致发光器件中有机层的稳定性。

  公开号：

  CN110183332B

文献信息

• 一种包含多环烷烃的芳香族衍生物及包含该 衍生物的有机电致发光器件
  申请人：陕西莱特光电材料股份有限公司

  公开号：CN110183332B

  公开（公告）日：2020-04-24

  本发明涉及一种包含多环烷烃的芳香族衍生物及包含该衍生物的有机电致发光器件，结构如下化学式Ⅰ所示：本发明化合物是包含多环烷烃为骨架的芳香族衍生物，呈现出优良的稳定性和高耐热性；能够大幅减少能量损失，能够形成稳定的稠环。本发明包含多环烷烃的芳香族衍生物能够提高有机电致发光器件中有机层的稳定性。
• Pharmaceutical/cosmetic compositions comprising a novel RARbeta receptor-activating ligand
  申请人：Collette Pascal

  公开号：US20070004698A1

  公开（公告）日：2007-01-04

  Novel ligand compounds having the structural formula (I): and the salts and optical/geometrical isomers thereof are suited for formulation into pharmaceutical compositions useful in human or veterinary medicine, or, alternatively, into cosmetic compositions.

  具有结构式(I)的新型配体化合物及其盐和光学/几何异构体适用于制备用于人类或兽医药物的制剂，或者用于化妆品制剂。
• QUINICLIDINE DERIVATIVES OF (HETERO) ARYLCYCLOHEPTANECARBOXYLIC ACID AS MUSCARINIC RECEPTOR ANTAGONISTS
  申请人：Ford Rhonan

  公开号：US20130005695A1

  公开（公告）日：2013-01-03

  The invention provides compounds of formula (I) wherein R 4 is a group of formula (II) or (IIIa) or (IIIb) and R 1 , R 2 , R 3 , R 5 , a, b and X are as defined in the specification, a process for their preparation, pharmaceutical compositions containing them, a process for preparing pharmaceutical compositions, their use in therapy and intermediates of use in their preparation
• [EN] PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIF, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT ACTINIQUE, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2012133257A1

  公开（公告）日：2012-10-04

  A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE À UN RAYONNEMENT, FILM DE RÉSIST ET PROCÉDÉ DE FORMATION D'UN MOTIF UTILISANT CHACUN LA COMPOSITION, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2013008700A1

  公开（公告）日：2013-01-17

  An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a compound represented by the following formula (I); and (B) a resin: wherein X represents an oxygen atom, a sulfur atom or -N(Rx)-; each of R1 to R8 and Rx independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an alkylcarbonyloxy group, an aryl group, an aryloxy group, an aryloxycarbonyl group or an arylcarbonyloxy group; and R1 to R8 may combine with each other to form a ring, provided that at least two members out of R1 to R8 represent a structure represented by the following formula (II) as defined in the specification.