1,1-Di-m-tolyl-ethanol | 460742-49-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1-Di-m-tolyl-ethanol
• 英文别名: 1,1-Bis(3-methylphenyl)ethanol
• CAS: 460742-49-8
• 化学式: C₁₆H₁₈O
• 分子量: 226.318
• InChiKey: MYODSBBKBRXEPM-UHFFFAOYSA-N

物化性质

• 沸点：
  353.8±11.0 °C(Predicted)
• 密度：
  1.046±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1,1-Di-m-tolyl-ethanol 在 sodium hydroxide 、 sodium tetrahydroborate 、 potassium hydrogensulfate 、 三氟化硼乙醚 、 双氧水 作用下， 生成 2,2-di-meta-toluylethanol
  参考文献：
  名称：

  Substituent Effect Studies of Aryl-Assisted Solvolyses. I. The Acetolysis of 2,2-Bis(substituted phenyl)ethylp-Toluenesulfonates

  摘要：

  在90.10 °C下，2,2-双（取代苯基）乙基对甲苯磺酸酯的醇解反应中，取代基效应可以通过Yukawa–Tsuno（LArSR）关系进行准确描述，给出了ρ值为−4.44和r值为0.53。该系统中包含两个芳香基的取代基效应与包含单个芳香基的2-甲基-2-苯基丙基系统的相关性相当可比，这表明这两个系统的过渡态结构非常相似。根据这种反应的公认机制，结果可以合理地解释为涉及一个速率决定的芳基辅助过渡态，其中两个β-芳基中的仅一个芳基参与反应。

  DOI：

  10.1246/bcsj.66.3015
• 作为产物：
  描述：

  3-溴甲基苯 、 乙酰氯 在 正丁基锂 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 6.5h， 生成 1,1-Di-m-tolyl-ethanol
  参考文献：
  名称：

  Base-promoted addition of DMA with 1,1-diarylethylenes: application to a total synthesis of (−)-sacidumlignan B

  摘要：

  将DMA添加到1,1'-二芳基乙烯中，通过碱促进，已经被开发出来，这导致了(−)-sacidumlignan B的新合成策略。

  DOI：

  10.1039/d0ob00376j

文献信息

• Bronsted Acid/Organic Photoredox Cooperative Catalysis: Easy Access to Tri- and Tetrasubstituted Alkenylphosphorus Compounds from Alcohols and P–H Species
  作者：Peizhong Xie、Jing Fan、Yanan Liu、Xiangyang Wo、Weishan Fu、Teck-Peng Loh

  DOI：10.1021/acs.orglett.8b01173

  日期：2018.6.1

  A Bronsted acid/organic photoredox cooperative catalytic system toward P–C bond formation from alcohols and P–H species is developed. With the assistance of visible light and TBHP, the reactions proceeded smoothly in an environmentally benign manner to give various alkenylphosphorus compounds in high efficiency.

  开发了一种布朗斯台德酸/有机光氧化还原协同催化系统，该催化系统可用于由醇和PH物质形成P-C键。在可见光和TBHP的辅助下，反应以对环境有益的方式顺利进行，从而高效地得到各种链烯基磷化合物。
• Iodine-mediated 1,2-aryl migration of primary benzhydryl amines
  作者：Yangxu Du、Jiao Hou、Qing Lu、Wei Hao、Wenquan Yu、Junbiao Chang

  DOI：10.1039/d1nj02932k

  日期：——

  An iodine-mediated 1,2-aryl migration reaction of primary benzhydryl amines under transition metal-free conditions has been achieved. The crude imines generated by this rearrangement reaction can be directly transformed into various aromatic secondary amine derivatives via reduction or addition reactions. This sequential synthetic process is operationally simple and can be successfully conducted on

  已经实现了在无过渡金属条件下碘介导的二苯甲基伯胺的 1,2-芳基迁移反应。这种重排反应生成的粗亚胺可以通过还原或加成反应直接转化为各种芳香族仲胺衍生物。这种顺序合成过程在操作上很简单，并且可以在克规模上成功进行。
• Non-Linearity and Non-Additivity of Substituent Effects in Solvolysis of 1,1-Diphenylethyl<i>p</i>-Nitrobenzoates
  作者：Md. Khabir Uddin、Mizue Fujio、Hyun-Joong Kim、Zvi Rappoport、Yuho Tsuno

  DOI：10.1246/bcsj.75.1371

  日期：2002.6

  conductimetrically at 25 °C in 80% (v/v) aqueous acetone. A linear Yukawa–Tsuno (Y–T) correlation was found for the symmetrical subseries (X = Y), showing a precise additivity relationship for the whole substituent range with ρsym = -3.78 and rsym = 0.77. The unsymmetrical subsets (X ≠ Y) gave statistically less reliable Y–T correlations, the apparent ρ value decreasing significantly when the fixed substituent

  1,1-二芳基乙基对硝基苯甲酸酯和氯化物 Y-Ar(X-Ar)CMe-LG (LG = OPNB, Cl) 的溶剂分解速率已在 25 °C 下在 80% (v/v) 丙酮水溶液中通过电导测定. 对于对称子系列 (X = Y)，发现了线性 Yukawa-Tsuno (Y-T) 相关性，显示了整个取代基范围的精确可加性关系，ρsym = -3.78 和 rsym = 0.77。不对称子集（X ≠ Y）给出了统计上不太可靠的 Y-T 相关性，当固定取代基 Y 变得更加供电子时，表观 ρ 值显着降低，这符合反应性 - 选择性关系的预期。在整个分散模式中，任何固定 Y 子集中的强 p-π-供体和吸电子取代基都表现出与参考 ρsym 线上 X = Y 点的显着速率增强偏差，这表明过渡态的反哈蒙德位移。然而，pKR+ val 之间存在精确的扩展布朗斯台德线性关系……
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• RESIST PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20170075224A1

  公开（公告）日：2017-03-16

  A resist pattern-forming method comprises applying a chemically amplified resist material on a substrate to form a resist film on the substrate. The resist film is patternwise exposed to a radioactive ray having a wavelength of no greater than 250 nm. The resist film patternwise exposed is floodwise exposed to a radioactive ray having a wavelength of greater than 250 nm. The resist film floodwise exposed is baked and developed with a developer solution comprising an organic solvent. The chemically amplified resist material comprises a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The component comprises: a radiation-sensitive sensitizer generating agent, and at least one of a radiation-sensitive acid-and-sensitizer generating agent and a radiation-sensitive acid generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (B).