(1-Methoxy-1-methylethyl)cyclopropan | 104131-96-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (1-Methoxy-1-methylethyl)cyclopropan
• 英文别名: 2-Methoxypropan-2-ylcyclopropane
• CAS: 104131-96-6
• 化学式: C₇H₁₄O
• 分子量: 114.188
• InChiKey: NGOGPSGCUQMYLH-UHFFFAOYSA-N

物化性质

• 沸点：
  126.5±8.0 °C(Predicted)
• 密度：
  0.907±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  8
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  甲醇 、 2-(1-Cyclopropyl-1-methyl-ethyl)-2-(4-nitro-phenylazo)-malononitrile 生成 (1-Methoxy-1-methylethyl)cyclopropan
  参考文献：
  名称：

  碳-碳键的容易杂解。芳基偶氮二氰基甲烷作为能够产生叔枯基阳离子的离去基团和离去基团阴离子的氢键不敏感行为

  摘要：

  Les 分解 d'arylazo-1methyl-2 phenyl-2 propiononitriles dans des solvants polaires s'effectuent via l'heterolyse d'une liaison carbone-carbone pour generic le cation cumylium et la base conjuguee de l'arylhydrazonomalononitrile

  DOI：

  10.1021/ja00269a042

文献信息

• [EN] PYRROLONE MELANIN CONCENTRATING HORMONE RECEPTOR-1 ANTAGONISTS<br/>[FR] ANTAGONISTES DE RÉCEPTEUR D'HORMONE CONCENTRANT LA MÉLANINE 1 DE TYPE PYRROLONE
  申请人：BRISTOL MYERS SQUIBB CO

  公开号：WO2010042674A1

  公开（公告）日：2010-04-15

  The present application provides compounds, including all stereoisomers, solvates, prodrugs and pharmaceutically acceptable forms thereof according to Formula I wherein R1, Formula Ia, R4, R5, Formula Ib, R3, R3a, W, D, R2a, R2b and R2c are defined herein. Additionally, the present application provides pharmaceutical compositions containing at least one compound according to Formula I and optionally at least one additional therapeutic agent. Finally, the present application provides methods for treating a patient suffering from an MCHR-1 modulated disease or disorder such as, for example, obesity, diabetes, depression, anxiety or intestinal inflammation, by administration of a therapeutically effective dose of a compound according to Formula I.

  本申请提供了根据公式I提供的化合物，包括所有立体异构体、溶剂合物、前药和药用可接受形式，其中R1、公式Ia、R4、R5、公式Ib、R3、R3a、W、D、R2a、R2b和R2c在此处定义。此外，本申请提供了含有至少一种根据公式I的化合物和可选至少一种额外治疗剂的药物组合物。最后，本申请提供了治疗患有MCHR-1调节性疾病或紊乱的患者的方法，例如肥胖、糖尿病、抑郁症、焦虑或肠道炎症，通过给予根据公式I的化合物的治疗有效剂量。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• PYRROLONE MELANIN CONCENTRATING HORMONE RECEPTOR-1 ANTAGONISTS
  申请人：Zhao Guohua

  公开号：US20110195986A1

  公开（公告）日：2011-08-11

  The present application provides compounds, including all stereoisomers, solvates, prodrugs and pharmaceutically acceptable forms thereof according to Formula I wherein R 1 , R 4 , R 5 , R 3 , R 3a , W, D, R 2a , R 2b and R 2c are defined herein. Additionally, the present application provides pharmaceutical compositions containing at least one compound according to Formula I and optionally at least one additional therapeutic agent. Finally, the present application provides methods for treating a patient suffering from an MCHR-1 modulated disease or disorder such as, for example, obesity, diabetes, depression, anxiety or intestinal inflammation, by administration of a therapeutically effective dose of a compound according to Formula I.

  本申请提供了按照式I定义的化合物，包括所有立体异构体、溶剂合物、前药和药学上可接受的形式，其中R1、R4、R5、R3、R3a、W、D、R2a、R2b和R2c在此定义。此外，本申请提供了含有至少一种式I化合物和可选的至少一种额外治疗剂的制药组合物。最后，本申请提供了通过给予式I化合物的治疗有效剂量来治疗患有MCHR-1调节性疾病或失调的患者的方法，例如肥胖症、糖尿病、抑郁症、焦虑症或肠道炎症。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150185612A1

  公开（公告）日：2015-07-02

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

  提供一种光致射线敏感或辐射敏感的树脂组合物，包括：（A）具有特定公式表示的重复单元和能够通过酸作用分解产生极性基团的基团的树脂；以及具有特定公式表示的离子化合物，以及包括该光致射线敏感或辐射敏感的树脂组合物的抗蚀膜。