methacrylic acid-(2-methoxymethoxy-ethyl ester) | 76392-21-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: methacrylic acid-(2-methoxymethoxy-ethyl ester)
• 英文别名: Methacrylsaeure-(2-methoxymethoxy-aethylester)；methoxymethoxyethyl (meth)acrylate；2-(Methoxymethoxy)ethyl 2-methylprop-2-enoate
• CAS: 76392-21-7
• 化学式: C₈H₁₄O₄
• 分子量: 174.197
• InChiKey: PDTDJRYFNGKLHD-UHFFFAOYSA-N

物化性质

• 沸点：
  78-79 °C(Press: 3 Torr)
• 密度：
  1.0354 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  12
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2-(methoxymethoxy)ethanol 、 甲基丙烯酸甲酯 在 sodium methylate 、 苯 作用下， 生成 methacrylic acid-(2-methoxymethoxy-ethyl ester)
  参考文献：
  名称：

  Linear polymers which have formalcontaining extralinear substituents and which are obtained from monoethylenically unsaturated compounds

  摘要：

  公开号：

  US02570861A1

文献信息

• Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：EP2472324A1

  公开（公告）日：2012-07-04

  Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供了含有缩醛基团的(甲基)丙烯酸酯单体，含有由这种单体形成的单元的聚合物和含有这种聚合物的光阻组成物。这些单体、聚合物和光阻组成物在形成光刻图案方面非常有用。此外，还提供了用光阻组成物涂覆的基板、形成光刻图案的方法和电子设备。这些组成物、方法和涂覆的基板在制造半导体器件方面具有特殊的适用性。
• MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
  申请人：Ober Matthias S.

  公开号：US20130011783A1

  公开（公告）日：2013-01-10

  Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供含有缩醛基团的（甲基）丙烯酸酯单体，包含由这种单体形成的单元的聚合物，以及含有这种聚合物的光刻胶组合物。这些单体、聚合物和光刻胶组合物可用于形成光刻图案。还提供了涂有光刻胶组合物的基板、形成光刻图案的方法和电子设备。这些组合物、方法和涂层基板在半导体器件制造中具有特定的适用性。
• Process for synthesis of polymer compositions, polymer compositions obtainable by the process, and use of the same
  申请人：RohMax Additives GmbH

  公开号：US20030060587A1

  公开（公告）日：2003-03-27

  The present invention relates to a process for synthesis of polymer compositions with reduced catalyst content, wherein ethylenically unsaturated monomers containing less than 0.5 wt % of ethylenically unsaturated monomers with at least one carboxylic group, sulfonic acid group and/or at least one phosphonic acid group relative to the total weight of the ethylenically unsaturated monomers are polymerized by means of initiators containing a transferable group of atoms and of one or more catalysts comprising at least one transition metal in the presence of ligands which can form a coordination compound with the metal catalyst or catalysts and, after the polymerization, the catalyst contained in the polymer is at least partly separated. For this purpose, the polymer composition is filtered, after the polymerization, in the presence of at least one filter aid which contains at least 0.5 wt%, relative to the total weight of the filter aid, of repeating units that contain at least one carboxylic acid group, sulfonic acid group and/or at least one phosphonic acid group.

  本发明涉及一种合成聚合物组合物的过程，其具有降低催化剂含量的效果。在该过程中，含有少于0.5重量％的至少含有一个羧基，磺酸基和/或至少一个膦酸基的乙烯基不饱和单体相对于乙烯基不饱和单体的总重量进行聚合，通过含有可转移原子团的引发剂和至少一种过渡金属的催化剂，在与可以形成与金属催化剂或催化剂配合物的配体一起的情况下进行聚合，在聚合之后，聚合物中的催化剂至少部分被分离。为此，在聚合之后，通过至少一种过滤助剂过滤聚合物组合物，该过滤助剂相对于总重量含有至少0.5重量％的重复单元，其中包含至少一个羧酸基，磺酸基和/或至少一个膦酸基。
• End-capped polymer chains and products thereof
  申请人：Faust Rudolf

  公开号：US20050176903A1

  公开（公告）日：2005-08-11

  According to an aspect of the present invention, a method is provided in which a double diphenylethylene compound is reacted with a polymer that contains a carbocationically terminated chain thereby providing a 1,1-diphenylene end-functionalized chain. Subsequently, an alkylating agent is reacted with the 1,1 -diphenylene end-functionalized chain, thereby providing an alkylated 1,1-diphenylene end-functionalized chain. In some embodiments, the method further comprises (a) optionally combining a 1,1-diphenylorganolithium compound with the alkylated 1,1-diphenylene end-functionalized polymer followed by (b) reacting an organolithium compound with the alkylated 1,1-diphenylene end-functionalized polymer. This provides an anionically terminated polymer, which can be used, for example, in subsequent anionic polymerization and coupling reactions. According to another aspect of the present invention, a novel polymer is provided that comprises a polymer chain, which chain further comprises the following: (a) a plurality of constitutional units that correspond to cationically polymerizable monomer species and (b) an end-cap comprising a group or a group, where R is a branched or unbranched alkyl group containing from 1 to 20 carbons and R 1 is a branched, unbranched, or cyclic alkyl group or an aryl group, containing from 1 to 20 carbons. Other aspects of the present invention relate to novel copolymers that comprise: (a) a first polymer block that comprises a plurality of constitutional units that correspond to isobutylene; and (b) a second polymer block that comprises a plurality of constitutional units that correspond to hydroxyethyl methacrylate.

  根据本发明的一个方面，提供了一种方法，其中将双二苯基乙烯化合物与含有碳阳离子终止链的聚合物反应，从而提供1,1-二苯基末端官能化链。随后，与1,1-二苯基末端官能化链反应烷基化试剂，从而提供烷基化的1,1-二苯基末端官能化链。在某些实施例中，该方法进一步包括(a)选择性地将1,1-二苯基有机锂化合物与烷基化的1,1-二苯基末端官能化聚合物组合，然后(b)将有机锂化合物与烷基化的1,1-二苯基末端官能化聚合物反应。这提供了一个阴离子终止聚合物，例如可用于随后的阴离子聚合和偶联反应。根据本发明的另一个方面，提供了一种新的聚合物，其包括聚合物链，该链进一步包括以下内容：(a)对应于阳离子聚合单体种类的多个构成单元，以及(b)包括一个组或一个组的末端盖，其中R是含1至20个碳的分支或非分支烷基基团，R1是含1至20个碳的分支、非分支或环烷基基团或芳基基团。本发明的其他方面涉及包括：(a)第一聚合物块，其包括对应于异丁烯的多个构成单元；以及(b)第二聚合物块，其包括对应于羟乙基甲基丙烯酸酯的多个构成单元的新共聚物。
• End-Capped Polymer Chains and Products Thereof
  申请人：Faust Rudolf

  公开号：US20080275202A1

  公开（公告）日：2008-11-06

  The present invention is directed to copolymers that include a plurality of constitutional units that correspond to cationically polymerizable monomer species and a second polymer block that comprises a plurality of constitutional units that correspond to an anionically polymerizable vinylpyridine, e.g., 2-vinylpyridine, and methods for making the same. Such copolymers can also include a linking moiety, e.g., a Formula (I) group, a Formula (II) group, or any combinations thereof.

  本发明涉及包括多个构成单元的共聚物，这些构成单元对应于阳离子聚合单体种类和包括多个构成单元的第二聚合物块，这些构成单元对应于阴离子聚合的乙烯基吡啶，例如2-乙烯基吡啶，以及制备它们的方法。这种共聚物还可以包括连接基，例如Formula (I)基团，Formula (II)基团或其任意组合。