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(methoxymethoxy)cyclopentane | 42604-08-0

中文名称
——
中文别名
——
英文名称
(methoxymethoxy)cyclopentane
英文别名
Methoxymethoxycyclopentan;Methoxymethoxycyclopentane
(methoxymethoxy)cyclopentane化学式
CAS
42604-08-0
化学式
C7H14O2
mdl
——
分子量
130.187
InChiKey
HESHNEGWPWFJRX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.3
  • 重原子数:
    9
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    2-(环戊氧基)乙酸sodium methylate 作用下, 以 甲醇 为溶剂, 以84%的产率得到(methoxymethoxy)cyclopentane
    参考文献:
    名称:
    醇的电化学甲氧基甲基化–一种制备MOM醚和其他缩醛的新型,绿色,安全的方法† ‡
    摘要:
    成功开发了一种新的,绿色的,安全的,具有成本效益的和高效的电化学方法,用于醇和酚的甲氧基甲基化。该方法还用于取代乙缩醛的合成。
    DOI:
    10.1039/c8cc05843a
点击查看最新优质反应信息

文献信息

  • SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20170305848A1
    公开(公告)日:2017-10-26
    A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X − represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
    一种对活性能量射线具有高敏感度的新型磺鎓盐,包括该磺鎓盐的光酸发生剂以及含有该光酸发生剂的光敏组合物。该磺鎓盐由公式(a1)表示。在该公式中,R1和R2分别表示由公式(a2)表示的基团或可能被卤素原子取代的烷基基团,R1和R2彼此相连并且可以与公式中的硫原子形成环,R3表示由公式(a3)表示的基团或由公式(a4)表示的基团,A1表示S或类似物,X-表示一价阴离子,且R1和R2不同时为可能被卤素原子取代的烷基基团。在公式(a2)到(a4)中,环Z1表示芳香族碳氢环,R4、R6、R9和R10各自表示特定的一价基团,R5、R7和R8各自表示特定的二价基团,A2和A3各自表示S或类似物,m1表示0或更多的整数,n1和n2各自表示0或更多。
  • 1-SUBSTITUTED TETRAHYDROISOQUINOLINE COMPOUND
    申请人:Astellas Pharma Inc.
    公开号:EP2149560A1
    公开(公告)日:2010-02-03
    Provided is a compound useful as an N-type Ca2+ channel blocker. As a result of intensive studies of compounds having an action of blocking N-type Ca2+ channels, the present inventors found that a tetrahydroisoquinoline compound of the present invention having a substituent at the 1-position has an action of blocking the N-type Ca2+ channels, an antinociceptive pain action, an antineuropathic pain action, an abdominal pain-inhibitory action and an opioid-induced constipation-improving action, and the present invention has been completed based on these findings. The compound of the present invention can be used as a pharmaceutical composition for preventing and/or treating various pains such as neuropathic pain and nociceptive pain, headaches such as migraine and cluster headache, central nervous system diseases such as anxiety, depression, epilepsy, cerebral stroke and restless legs syndrome, abdominal symptoms such as abdominal pain and abdominal distension, stool abnormalities such as diarrhea and constipation, digestive system diseases such as irritable bowel syndrome, urinary system diseases such as overactive bladder and interstitial cystitis, etc.
    本发明提供了一种可用作 N 型 Ca2+ 通道阻断剂的化合物。经过对具有阻断 N 型 Ca2+ 通道作用的化合物的深入研究,本发明人发现本发明的一种在 1 位上具有取代基的四氢异喹啉化合物具有阻断 N 型 Ca2+ 通道的作用、抗痛觉痛作用、抗神经病理性痛作用、腹痛抑制作用和阿片类药物诱导的便秘改善作用,并根据这些发现完成了本发明。本发明的化合物可作为药物组合物用于预防和/或治疗各种疼痛,如神经病理性疼痛和痛觉疼痛、头痛,如偏头痛和丛集性头痛、中枢神经系统疾病,如焦虑症、抑郁症、癫痫、腹痛和腹胀等腹部症状,腹泻和便秘等大便异常,肠易激综合征等消化系统疾病,膀胱过度活跃和间质性膀胱炎等泌尿系统疾病等。
  • METHOD FOR PRODUCING CYCLOPENTYL ALKYL ETHER COMPOUND
    申请人:Zeon Corporation
    公开号:EP3398928A1
    公开(公告)日:2018-11-07
    The present invention is a method for producing a cyclopentyl alkyl ether compound represented by formula (1): R1-O-R2 (wherein, R1 represents an alkyl group having 1 to 10 carbon atoms that may have a substituent or a cycloalkyl group having 3 to 8 carbon atoms that may have a substituent, and R2 represents a cyclopentyl group that may have a substituent), wherein a cyclopentene that may have a substituent is reacted with an alcohol compound represented by formula (2): R1OH (wherein R1 represents the same as described above) in the presence of an acidic zeolite having a silica/alumina ratio of 80 or higher. The present invention provides a method for producing a cyclopentyl alkyl ether compound, wherein a reaction can be carried out in a liquid phase, catalyst activity is less lowered over time (long catalyst life), and a desired cyclopentyl alkyl ether compound can be continuously produced with high reaction efficiency and long-term stability even when a large amount of raw material is fed.
    本发明是一种生产由式(1)代表的环戊基烷基醚化合物的方法:R1-O-R2(其中,R1 代表具有 1 至 10 个碳原子且可具有取代基的烷基或具有 3 至 8 个碳原子且可具有取代基的环烷基,R2 代表可具有取代基的环戊基),其中,可具有取代基的环戊烯与式(2)代表的醇化合物反应:R1OH(其中 R1 代表与上述相同),在二氧化硅/氧化铝比率为 80 或更高的酸性沸石存在下进行反应。本发明提供了一种生产环戊基烷基醚化合物的方法,在该方法中,反应可在液相中进行,催化剂活性随时间降低的程度较小(催化剂寿命长),而且即使加入大量原料,也可连续生产出所需的环戊基烷基醚化合物,且反应效率高,长期稳定。
  • Surface-Mediated Solid Phase Reaction. PART 7.<sup>1</sup>A Simple and Convenient Procedure for the Methoxymethylation of Alcohols with Methoxymethyl Chloride on the Surface of Alumina
    作者:B. C. Ranu、A. Majee、A. R. Das
    DOI:10.1080/00397919508011367
    日期:1995.2
    A variety of alcohols react with methoxymethyl chloride on the surface of alumina without any solvent to afford the corresponding methoxymethyl ethers in good yields.
  • (Meth)Acrylate, Polymer and Resist Composition
    申请人:Ootake Atsushi
    公开号:US20080003529A1
    公开(公告)日:2008-01-03
    A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.
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