申请人:Fujifilm Corporation
公开号:EP2450746A1
公开(公告)日:2012-05-09
A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin (B) containing a hydroxystyrene-based repeating unit and a repeating unit having an acid decomposable group; and (C) a compound having a specific structure, which decomposes by the action of an acid to generate and acid, and a pattern forming method using the positive resist composition, are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition.
本发明提供了一种正抗蚀剂组合物,该组合物由以下部分组成:(A)一种化合物,该化合物在接受放 射线或辐射照射时能够生成一种酸;(B)一种树脂,该树脂能够在酸的作用下增加在碱显影剂中的溶解度,该树脂(B)含有羟基苯乙烯基重复单元和具有可被酸分解的基团的重复单元;和 (C) 具有特定结构的化合物,该化合物在酸的作用下分解生成和酸,并提供了使用该正抗蚀剂组合物的图案形成方法,该正抗蚀剂组合物在正常曝光(干法曝光)、浸渍曝光和双重曝光时,在图案轮廓、线边缘粗糙度、图案塌陷、灵敏度和分辨率方面表现出良好的性能。