3-乙基-2-甲基戊烷-2-醇 | 19780-63-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 3-乙基-2-甲基戊烷-2-醇
• 中文别名: 2-戊醇,3-乙基-2-甲基-
• 英文名称: 3-ethyl-2-methyl-pentan-2-ol
• 英文别名: 3-Aethyl-2-methyl-pentan-2-ol；Dimethyl-(diaethyl-carbin)-carbinol；3-Methoaethylol-(3¹)-pentan；3-Ethyl-2-methyl-2-pentanol；3-ethyl-2-methylpentan-2-ol
• CAS: 19780-63-3
• 化学式: C₈H₁₈O
• 分子量: 130.23
• InChiKey: FRUMTAZIGSJVOJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  9
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  3-乙基-2-甲基戊烷-2-醇 在 盐酸 、 tin 、 三氯化铝 、 硝酸 作用下， 生成 4-(2-ethyl-1,1-dimethyl-butyl)-phenol
  参考文献：
  名称：

  Condensation of Tertiary Aliphatic Alcohols with Aromatic Compounds in the Presence of Aluminum Chloride. IV. Tertiary Dimethyl Amyl Carbinols with Phenol

  摘要：

  DOI：

  10.1021/ja01870a019
• 作为产物：
  描述：

  2-乙基丁酸乙酯 、 甲基溴化镁 生成 3-乙基-2-甲基戊烷-2-醇
  参考文献：
  名称：

  The Effect of Cyclopentane and Cyclohexane Rings on the Reaction of Tertiary Alcohols and Chlorides¹

  摘要：

  DOI：

  10.1021/ja01641a026

文献信息

• OPTICAL RECORDING MEDIUM AND COMPOUND USED FOR THE SAME
  申请人：SHIOZAKI Hiroyoshi

  公开号：US20090306376A1

  公开（公告）日：2009-12-10

  A compound comprising a ring structure including a ring composed of four carbon atoms and two nitrogen atoms and a substituted or unsubstituted amino group bonded to the ring structure.

  一种化合物，包括一个环结构，其中包括由四个碳原子和两个氮原子组成的环，以及与环结构相结合的取代或未取代的氨基团。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
  申请人：Mori Kazunori

  公开号：US20120077126A1

  公开（公告）日：2012-03-29

  A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 8 represents a substituted or unsubstituted alkyl group or the like; and W 1 represents a single bond, a substituted or unsubstituted methylene group or the like.

  本发明的含氟聚合物包含通式（2）的重复单元（a），其具有1,000至1,000,000的质量平均分子量。该聚合物适用于抗高能辐射（波长小于或等于300nm的高能射线辐射或电子束辐射）的光阻组合物，或用于液体浸没光刻的面涂层组合物，并具有高水珠性，尤其是高后退接触角。在公式中，R1表示可聚合的双键含有的基团；R2表示氟原子或含氟烷基；R8表示取代或未取代的烷基或类似物；W1表示单键，取代或未取代的亚甲基或类似物。
• POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
  申请人：Masunaga Keiichi

  公开号：US20110212391A1

  公开（公告）日：2011-09-01

  A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.

  使用含有氟化羧基离子盐结构的重复单元的聚合物作为侧链，用于配制化学增感正型光刻胶组分。当该组分通过光刻工艺形成正型图案时，胶膜中的酸扩散均匀缓慢，从而改善LER。
• CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Masunaga Keiichi

  公开号：US20110212390A1

  公开（公告）日：2011-09-01

  A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning.

  提供了一种化学放大负型光刻胶组合物，包括（A）一种可溶于碱性溶液的基础聚合物，（B）一种酸发生剂，和（C）一种含氮化合物，基础聚合物（A）在酸的催化下变为碱不溶性。在侧链上含有氟化羧酸亚烷基盐的聚合物被包括在基础聚合物中。通过光刻工艺处理负型光刻胶组合物可以形成具有以下优点的光刻图案：酸的扩散均匀低、LER改善和减少衬底污染。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same
  申请人：Mori Kazunori

  公开号：US20110318542A1

  公开（公告）日：2011-12-29

  There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W 1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.

  本发明公开了一种含氟聚合物化合物，其包括下述通式（2）的重复单元（a），并且具有1000至1000000的重均分子量，其中R1表示聚合双键含有基团；R2表示氟原子或含氟烷基；R3表示氢原子、酸敏基团、交联位点或其他一价有机基团；W1表示连接基。当将该含氟聚合物化合物用于300纳米或更短波长的高能辐射或电子束辐射的图案形成的光阻化合物中时，可以形成具有良好矩形轮廓的光阻图案。

表征谱图