申请人:Watanabe Takeru
公开号:US20050095533A1
公开(公告)日:2005-05-05
Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.
含有苯并咪唑结构和特定醚链基团的含氮有机化合物组成的抗蚀组合物具有优异的分辨率,可以形成精确配置的图案,且侧壁粗糙度最小,适用于使用电子束或深紫外光进行微型加工。