2-Hydroxy-2-methyl-propionic acid 3-hydroxy-2,2-dimethyl-propyl ester | 25109-71-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Hydroxy-2-methyl-propionic acid 3-hydroxy-2,2-dimethyl-propyl ester
• 英文别名: (3-Hydroxy-2,2-dimethylpropyl) 2-hydroxy-2-methylpropanoate
• CAS: 25109-71-1
• 化学式: C₉H₁₈O₄
• 分子量: 190.24
• InChiKey: MBQUEDJDTPVSMU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  13
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2,2,6,6-Tetramethyl-1,4,8-trioxaspiro<2,5>octan 在 盐酸 作用下， 生成 2-Hydroxy-2-methyl-propionic acid 3-hydroxy-2,2-dimethyl-propyl ester
  参考文献：
  名称：

  Synthesis and some properties of 2,2,6,6-tetramethyl-1,4,8-trioxaspiro[2.5]octane, and epoxy ketene ketal

  摘要：

  DOI：

  10.1021/jo00834a083

文献信息

• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20130034813A1

  公开（公告）日：2013-02-07

  A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

  一种化学增感正型光刻胶组合物，包括（A）三氟甲基-3,3,3-三氟-2-羟基-2-丙酸磺酸盐，（B）酸发生剂，（C）碱性树脂和（D）有机溶剂，适用于ArF浸没光刻。羧酸磺酸盐具有高度疏水性，在浸没水中几乎不溶出。通过控制酸扩散，可以构建具有高分辨率的图案轮廓。
• FLUOROALCOHOL, FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20120077121A1

  公开（公告）日：2012-03-29

  Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R 1 is hydrogen or a monovalent C 1 -C 20 hydrocarbon group in which any constituent —CH 2 — moiety may be replaced by —O— or —C(═O)—, Aa is a (k 1 +1)-valent C 1 -C 20 hydrocarbon or fluorinated hydrocarbon group, and k 1 is 1, 2 or 3.

  公式（1）的氟醇化合物在生产用作基础树脂的聚合物方面很有用，这些聚合物用于配制对波长高达500纳米的辐射具有透明性和改进的开发特性的辐射敏感型光刻胶组合物。R1是氢或一价的C1-C20碳氢基团，在其中任何成分的—CH2—基团可以被—O—或—C(═O)—替代，Aa是(k1+1)-价的C1-C20碳氢基团或氟化碳氢基团，k1为1、2或3。
• RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
  申请人：Suka Yuuki

  公开号：US20130084517A1

  公开（公告）日：2013-04-04

  A protective film-forming composition comprising a polymer comprising fluorinated alcohol units of the structure: —C(CF 3 ) 2 OR 1 wherein R 1 is H or a monovalent hydrocarbon group and having a Mw of 1,000-500,000 is applied onto a resist film to form a protective film thereon. The protective film-forming composition has high water repellent and water slip performance. The protective film exhibits barrier properties to water and prevents any resist components from being leached out in water.
• US8835094B2
  申请人：——

  公开号：US8835094B2

  公开（公告）日：2014-09-16
• US9086628B2
  申请人：——

  公开号：US9086628B2

  公开（公告）日：2015-07-21