1-Butoxy-2-amyloxyethan | 26452-16-4

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Butoxy-2-amyloxyethan
• 英文别名: 1-butoxy-2-pentyloxy-ethane；1-Butoxy-2-pentyloxy-aethan；Aethylenglykol-butylaether-pentylaether；1-(2-Butoxyethoxy)pentane
• CAS: 26452-16-4
• 化学式: C₁₁H₂₄O₂
• 分子量: 188.31
• InChiKey: KNTUPCOHGQQHBD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  13
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD
  申请人：KANEKA CORPORATION

  公开号：US20210114967A1

  公开（公告）日：2021-04-22

  A resist composition for pattern printing contains a binder, a filler, a thickener, and a polyfunctional (meth)acrylate. The resist composition does not contain a photoinitiator. The resist composition also contains photocatalytic titanium oxide. A method for forming a pattern includes a resist composition that is pattern-wise printed, and then the resist composition is irradiated with an actinic radiation such that seepage of the resist component from an end of the pattern during the pattern formation using the resist composition is suppressed and the seepage portion is decomposed. As a result, it is possible to drastically reduce the seepage without impairing the rheology of the resist composition and additionally, to remove a slightly seeping portion without requiring, for example, a harmful ozone treatment or the like.
• US5442117A
  申请人：——

  公开号：US5442117A

  公开（公告）日：1995-08-15