ethyl-decahydro[2]naphthyl ether | 100249-97-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: ethyl-decahydro[2]naphthyl ether
• 英文别名: Aethyl-decahydro[2]naphthyl-aether；2-Ethoxy-1,2,3,4,4a,5,6,7,8,8a-decahydronaphthalene
• CAS: 100249-97-6
• 化学式: C₁₂H₂₂O
• 分子量: 182.306
• InChiKey: KUCQAVAEZCHOKO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  碘乙烷 、 alkaline earth salt of/the/ methylsulfuric acid 在 甲苯 作用下， 生成 ethyl-decahydro[2]naphthyl ether
  参考文献：
  名称：

  Leroux, Annales de Chimie (Cachan, France), 1910, vol. <8> 21, p. 509,521

  摘要：

  DOI：

文献信息

• PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
  申请人：LEE Jae-Woo

  公开号：US20090155714A1

  公开（公告）日：2009-06-18

  A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.

  本发明揭示了一种比传统光刻胶更小的大小，具有明确定义（均匀）结构的光敏化合物，以及包括该光敏化合物的光刻胶组合物。该光敏化合物由以下公式表示。此外，本发明提供了一种光刻胶组合物，包括1至85重量％（重量％）的光敏化合物；相对于100重量部的光敏化合物0.05至重量份的光酸发生剂；以及10至5000重量部的有机溶剂。在公式中，n为0或1，x为1、2、3、4或5，y为2、3、4、5或6，z为0、1、2、3或4，R、R'和R"分别为1至30碳原子的烃基，优选为2至20碳原子，R'"为氢原子或1至30碳原子的烃基，优选为2至20碳原子。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130004888A1

  公开（公告）日：2013-01-03

  An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).

  本发明的目的是提供一种光致或辐射致敏树脂组合物，该组合物可以形成具有高分辨率和优秀形状的独立线型图案，并显示出包括粗糙特性在内的优异的抗阻性能，以及提供使用该组合物的光致或辐射致敏膜和图案形成方法。光致或辐射致敏树脂组合物包含一种化合物（P），该化合物含有至少一个酚羟基和至少一个氢原子被代表如下通式（1）的基团取代的酚羟基的基团（式中各符号与权利要求书和说明书中的定义相同）。
• Cetp Inhibitors
  申请人：Ali Amjad

  公开号：US20090264405A1

  公开（公告）日：2009-10-22

  Compounds of Formula I, including pharmaceutically acceptable salts of the compounds, are CETP inhibitors, and are useful for raising HDL-cholesterol, reducing LDL-cholesterol, and for treating or preventing atherosclerosis.
• US7241553B2
  申请人：——

  公开号：US7241553B2

  公开（公告）日：2007-07-10
• US7947423B2
  申请人：——

  公开号：US7947423B2

  公开（公告）日：2011-05-24