Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
FLUORINATED MONOMERS, FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY
申请人:E. I. du Pont de Nemours and Company
公开号:EP1539690A2
公开(公告)日:2005-06-15
US7326796B2
申请人:——
公开号:US7326796B2
公开(公告)日:2008-02-05
[EN] FLUORINATED MONOMERS, FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY<br/>[FR] MONOMERES FLUORES, POLYMERES FLUORES COMPRENANT DES GROUPES POLYCYCLIQUES POSSEDANT DES NOYAUX HETEROCYCLIQUES CONDENSES A 4 ELEMENTS, SERVANT DE PHOTORESINES, ET PROCEDES DE MICROLITHOGRAPHIE
申请人:DU PONT
公开号:WO2004014960A2
公开(公告)日:2004-02-19
The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.