4,4-二甲-3-己酮 | 19550-14-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 4,4-二甲-3-己酮
• 英文名称: 4,4-dimethyl-hexan-3-one
• 英文别名: 4,4-Dimethyl-hexan-3-on；Aethyl-tert.-pentyl-keton；Aethyl-tert.-amyl-keton；δ-Oxo-γ.γ-dimethyl-hexan；4,4-Dimethyl-3-hexanone；4,4-dimethylhexan-3-one
• CAS: 19550-14-2
• 化学式: C₈H₁₆O
• 分子量: 128.214
• InChiKey: YEDJXYBDQSVPFJ-UHFFFAOYSA-N

物化性质

• 熔点：
  -32.24°C (estimate)
• 沸点：
  151.05°C
• 密度：
  0.8285

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  9
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

安全信息

• 海关编码：
  2914190090

反应信息

• 作为反应物：
  描述：

  4,4-二甲-3-己酮 在 potassium dichromate 、 硫酸 作用下， 生成 2,2-二甲基丁酸
  参考文献：
  名称：

  Herschmann, Monatshefte fur Chemie, 1893, vol. 14, p. 238

  摘要：

  DOI：
• 作为产物：
  描述：

  magnesium,2-methylbutane,chloride 在 copper(I) chloride 作用下， 生成 4,4-二甲-3-己酮
  参考文献：
  名称：

  Dubois,J.-E.; Lion,C., Comptes Rendus des Seances de l'Academie des Sciences, Serie C: Sciences Chimiques, 1975, vol. 280, p. 217 - 219

  摘要：

  DOI：

文献信息

• SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160334702A1

  公开（公告）日：2016-11-17

  A salt represented by formula (I): wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, R 1 and R 2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C 1 to C 6 perfluoroalkyl group, z represents an integer of 0 to 6, X 1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R 1 )(R 2 ) or C(Q 1 )(Q 2 ), A 1 represents a C 4 to C 24 hydrocarbon group having a C 4 to C 18 divalent alicyclic hydrocarbon moiety, A 2 represents a C 2 to C 12 divalent hydrocarbon group, R 3 and R 4 independently represent a hydrogen atom or a C 1 to C 6 monovalent saturated hydrocarbon group, R 5 represents a hydrogen atom, a fluorine atom, or a C 1 to C 6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z + represents an organic cation.

  公式(I)表示的盐，其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团，R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团，z代表0到6的整数，X1代表*—CO—O—，*—O—CO—或—O—，*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置，A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团，A2代表C2至C12的二价烃基团，R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团，R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团，其中氢原子可以被氟原子替换，而Z+代表一个有机阳离子。
• SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160200702A1

  公开（公告）日：2016-07-14

  A salt represented by the formula (I): wherein R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R 2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

  由公式(I)表示的盐： 其中 R1 代表一个C1至C12的烷基，其中一个亚甲基基团可以被一个氧原子或一个羰基团所取代； Q1 和 Q2 各自独立地代表一个氟原子或一个C1至C6的全氟烷基团； A1 代表一个含有内酯环的基团，该基团有4到24个碳原子； R2 代表一个酸不稳定的基团；并且 “m”代表一个0到3之间的整数。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160130210A1

  公开（公告）日：2016-05-12

  A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R 2 represents a C 1 to C 6 perfluoroalkyl group or *—CHR f1 R f2 , * represents a binding site to a carbonyl group, R f1 and R f2 each independently represent a C 1 to C 4 perfluoroalkyl group or R f1 and R f2 may be bonded together with a carbon atom bonded thereto to form a ring, A 1 represents a single bond, a C 1 to C 6 alkanediyl group or **-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -, ** represents a binding site to an oxygen atom, A 2 , A 3 , A 4 and A 5 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W 1 represents a C 5 to C 18 divalent alicyclic hydrocarbon group.

  化合物的化学式为（I），包括从该化合物衍生的结构单元的树脂和包括该树脂的抗蚀组合物： 其中R 1 代表氢原子、卤素原子或C 1 到C 6 烷基基团，其中氢原子可以被卤素原子取代，R 2 代表C 1 到C 6 全氟烷基基团或*—CHR f1 R f2 ，*代表与羰基结合位点，R f1 和R f2 各自独立代表C 1 到C 4 全氟烷基基团或R f1 和R f2 可以与结合在一起的碳原子形成环，A 1 代表单键，C 1 到C 6 烷二基基团或**-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -，**代表与氧原子结合位点，A 2 、A 3 、A 4 和A 5 各自独立代表C 1 到C 6 烷二基基团，X 1 和X 2 各自独立代表—O—、—CO—O—或—O—CO—，a和b各自代表0或1，W 1 代表C 5 到C 18 的二价脂环烃基团。
• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160168115A1

  公开（公告）日：2016-06-16

  A salt represented by formula (I): wherein R 1 and R 2 independently represent a hydrogen atom, a hydroxy group or a C 1 to C 12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, A 1 represents a single bond, a C 1 to C 24 alkanediyl group or the like, and Y represents an optionally substituted C 1 to C 18 alkyl group or monovalent C 3 to C 18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO 2 —, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO 2 —.

  一种由化学式（I）表示的盐：其中R1和R2分别表示氢原子、羟基或C1到C12的烃基，其中亚甲基可能被—O—或—CO—取代；m和n分别表示1或2；Ar表示可选取代的苯基；Q1和Q2分别表示氟原子或C1到C6的全氟烷基基团，A1表示单键，C1到C24的烷二基基团或类似物，Y表示可选取代的C1到C18的烷基基团或一价的C3到C18的脂环烃基团，其中的亚甲基团可能被—O—、O—或—SO2—取代，前提是烷基基团或脂环烃基团至少有一个取代基，或其中至少一个亚甲基团被—O—、—CO—或—SO2—取代。
• NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160145186A1

  公开（公告）日：2016-05-26

  A compound which is non-ionic compound, the compound has a group represented by formula (Ia): wherein R 2 represents a group having a C 3 to C 18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group, and * represents a binding site.

  一种非离子化合物，该化合物具有由式(Ia)表示的基团：其中R2代表具有C3到C18脂环烃基团的基团，其中亚甲基基团可以被氧原子或羰基取代，Rf1和Rf2分别独立地代表C1到C4全氟烷基基团，*代表一个结合位点。

表征谱图