4,5-二氢-2-(2-甲氧基苯基)-1-[2-(2-甲氧基苯基)-4,5-二苯基-2H-咪唑-2-基]-1H-咪唑 | 7292-18-4

• 物质功能分类: 有机原料 - 杂环化合物
• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 中文名称: 4,5-二氢-2-(2-甲氧基苯基)-1-[2-(2-甲氧基苯基)-4,5-二苯基-2H-咪唑-2-基]-1H-咪唑
• 英文名称: 2,2'-Bis-(o-anisyl)-4,4'-5,5'-tetraphenyl-1,2'-biimidazol
• 英文别名: 2,2'-bis-(2-methoxy-phenyl)-4,5,4',5'-tetraphenyl-2'H-[1,2']biimidazolyl；4,5-dihydro-2-(2-methoxyphenyl)-1-[2-(2-methoxyphenyl)-4,5-diphenyl-2H-imidazol-2-yl]-1H-imidazole；2-(2-Methoxyphenyl)-1-[2-(2-methoxyphenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole
• CAS: 7292-18-4
• 化学式: C₄₄H₃₄N₄O₂
• 分子量: 650.78
• InChiKey: VYQXQPVJLFTJQI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.2
• 重原子数：
  50
• 可旋转键数：
  9
• 环数：
  8.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  61
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• PHOTOPOLYMERIZATION METHOD, INK SET, IMAGE FORMATION METHOD, INK COMPOSITION, AND PHOTOPOLYMERIZATION INITIATOR AND WATER-SOLUBLE BIIMIDAZOLE USED THEREIN
  申请人：FUJI-FILM Corporation

  公开号：EP2899241A1

  公开（公告）日：2015-07-29

  A photopolymerization method in which an ink composition including (A) a polymerizing compound having an ethylenic unsaturated group, (B) a photopolymerization initiator represented by Formula (1) described below, and (C) a hydrogen donor having a structure in which a nitrogen atom is directly bonded to an aromatic ring, in which the aromatic ring has an electron-withdrawing group or the nitrogen atom constitutes a hetero ring, is photopolymerized under acidic conditions, in Formula (1), each of R1 to R30 represents a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group.

  一种在酸性条件下进行光聚合的油墨组合物的光聚合方法，其中包括：(A) 具有乙烯不饱和基团的聚合化合物；(B) 由下述式(1)表示的光聚合引发剂；(C) 具有氮原子直接键合到芳香环上的结构的氢供体，其中芳香环上有一个抽电子基团或氮原子构成一个杂环、 式（1）中，R1 至 R30 各代表氢原子、卤素原子、烷基或烷氧基。
• PHOTOPOLYMERIZATION METHOD, INK SET, INK COMPOSITION, AND WATER-SOLUBLE BIIMIDAZOLE
  申请人：FUJIFILM CORPORATION

  公开号：US20150148442A1

  公开（公告）日：2015-05-28

  A photopolymerization method in which an ink composition including (A) a polymerizing compound having an ethylenic unsaturated group, (B) a photopolymerization initiator represented by Formula (1) described below, and (C) a hydrogen donor having a structure in which a nitrogen atom is directly bonded to an aromatic ring, in which the aromatic ring has an electron-withdrawing group or the nitrogen atom constitutes a hetero ring, is photopolymerized under acidic conditions, in Formula (1), each of R 1 to R 30 represents a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group.
• NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, DISPLAY DEVICE AND METHOD FOR PRODUCING SAME
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20200356005A1

  公开（公告）日：2020-11-12

  A problem to be addressed by the present invention is to obtain: a cured film that has high sensitivity, makes it possible to prevent generation of a development residue arising from a pigment, and has excellent heat resistance and light-blocking ability; and a negative photosensitive resin composition that is formed into the cured film. A main object of the present invention is to obtain and use a negative photosensitive resin composition including: (A) an alkali-soluble resin, (B) a radical polymerizable compound, (C) a photo initiator, and (Da) a black pigment; wherein the (A) alkali-soluble resin contains one or more selected from (A1-1) a polyimide, (A1-2) a polyimide precursor, (A1-3) a polybenzoxazole, and (A1-4) a polybenzoxazole precursor; and wherein the (C) photo initiator contains at least (C1) an oxime ester photo initiator and (C2) an α-hydroxyketone photo initiator, wherein the content ratio of the (C1) oxime ester photo initiator is 51 to 95 mass % in the (C) photo initiator, and the content ratio of the (Da) black pigment is 5 to 50 mass % in all the solid contents of the negative photosensitive resin composition.
• NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND ORGANIC EL DISPLAY AND MANUFACTURING METHOD THEREFOR
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20210191264A1

  公开（公告）日：2021-06-24

  An object of the invention is to provide a cured film which is high in sensitivity, capable of forming a pattern in a low-taper shape after development, capable of the change in pattern opening width between before and after thermal curing, an excellent in light-blocking property, and a negative photosensitive resin composition that forms the film. The negative photosensitive resin composition contains an (A) alkali-soluble resin, a (C1) photo initiator, and a (Da) black colorant, where the (A) alkali-soluble resin contains a (A1) first resin including one or more selected from the group consisting of a (A1-1) polyimide, a (A1-2) polyimide precursor, a (A1-3) polybenzoxazole, and a (A1-4) polybenzoxazole precursor, and has a structural unit having a fluorine atom at a specific ratio, and the (C1) photo initiator contains an (C1-1) oxime ester-based photo initiator that has a specific structure.
• US9371460B2
  申请人：——

  公开号：US9371460B2

  公开（公告）日：2016-06-21