3-羟基-戊醛二甲基缩醛 | 100911-60-2

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 3-羟基-戊醛二甲基缩醛
• 英文名称: 3-hydroxy-valeraldehyde dimethylacetal
• 英文别名: 3-Hydroxy-valeraldehyd-dimethylacetal；1,1-Dimethoxy-pentan-3-ol；1,1-Dimethoxypentan-3-ol
• CAS: 100911-60-2
• 化学式: C₇H₁₆O₃
• 分子量: 148.202
• InChiKey: LTDOQXREVLFHMS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  38.7
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-羟基-戊醛二甲基缩醛 、 2,4-二硝基苯肼 在 盐酸 作用下， 生成 2-pentenal 2,4-dinitrophenyl hydrazone
  参考文献：
  名称：

  Gruenanger; Grieco, Gazzetta Chimica Italiana, 1958, vol. 88, p. 296,305

  摘要：

  DOI：
• 作为产物：
  描述：

  1,1-二甲氧基戊烷-3-酮 在 lithium aluminium tetrahydride 、 乙醚 作用下， 生成 3-羟基-戊醛二甲基缩醛
  参考文献：
  名称：

  Gruenanger; Grieco, Gazzetta Chimica Italiana, 1958, vol. 88, p. 296,305

  摘要：

  DOI：

文献信息

• METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
  申请人：ADEKA CORPORATION

  公开号：US20150175642A1

  公开（公告）日：2015-06-25

  Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

  揭示了一种具有适合用于CVD形成薄膜材料的物理性质的金属烷氧化物化合物，特别是一种具有适合用于形成金属铜薄膜材料的金属烷氧化物化合物。金属烷氧化物化合物由通式（I）表示。还描述了包括金属烷氧化物化合物的薄膜形成材料。（在公式中，R1代表甲基基团或乙基基团，R2代表氢原子或甲基基团，R3代表C1-3直链或支链烷基基团，M代表金属原子或硅原子，n代表金属原子或硅原子的价。
• METAL ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
  申请人：Adeka Corporation

  公开号：EP2921472A1

  公开（公告）日：2015-09-23

  The present invention provides a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. Specifically, the present invention provides a metal alkoxide compound represented by general formula (I), and a thin-film-forming material including the metal alkoxide compound. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

  本发明提供了一种金属氧化烷化合物，其物理性质适用于通过 CVD 形成薄膜的材料，特别是一种金属氧化烷化合物，其物理性质适用于形成金属铜薄膜的材料。具体地说，本发明提供了一种由通式（I）表示的金属氧化烷化合物，以及一种包括该金属氧化烷化合物的成膜材料。(式中：R1 代表甲基或乙基，R2 代表氢原子或甲基，R3 代表 C1-3 直链或支链烷基，M 代表金属原子或硅原子，n 代表金属原子或硅原子的价。
• Alcohol compound
  申请人：ADEKA CORPORATION

  公开号：US10155784B2

  公开（公告）日：2018-12-18

  An alcohol compound of formula (II) in which R4 represents a methyl group or an ethyl group, R5 represents a hydrogen atom, and R6 represents a C1-3 linear or branched alkyl group. The alcohol compound has physical properties suitable for a material for forming thin films by CVD, and particularly, physical properties suitable for a material for forming metallic-copper thin films.

  式（II）的醇类化合物，其中 R4 代表甲基或乙基，R5 代表氢原子，R6 代表 C1-3 直链或支链烷基。该醇化合物具有适用于通过 CVD 形成薄膜的材料的物理性质，特别是适用于形成金属铜薄膜的材料的物理性质。
• ALCOHOL COMPOUND
  申请人：ADEKA CORPORATION

  公开号：US20180134739A1

  公开（公告）日：2018-05-17

  Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R 1 represents a methyl group or an ethyl group, R 2 represents a hydrogen atom or a methyl group, R 3 represents a C 1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
• US9896468B2
  申请人：——

  公开号：US9896468B2

  公开（公告）日：2018-02-20