申请人:Hoffmann-La Roche Inc.
公开号:US05420129A1
公开(公告)日:1995-05-30
The invention is concerned with novel sulphonamides and their use as medicaments. In particular, the invention is concerned with compounds of the formula ##STR1## wherein R.sup.1 is hydrogen, lower-alkyl, lower-alkoxy, lower-alkylthio, halogen or trifluoromethyl; R.sup.2 is hydrogen, lower-alkyl, halogen, lower-alkoxy, trifluoromethyl or --OCH.sub.2 COOR.sup.9 ; R.sup.3 is hydrogen, lower-alkyl, halogen, lower-alkylthio, trifluoromethyl, lower-alkoxy or trifluoromethoxy; R.sup.2 and R.sup.3 together are butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; R.sup.4 is hydrogen, lower-alkyl, trifluoromethyl, lower-alkoxy, lower-alkylthio, hydroxy-lower-alkyl, hydroxy-lower-alkoxy, hydroxy-lower-alkoxy-lower-alkyl, hydroxy-lower-alkoxy-lower-alkoxy, alkoxy-lower-alkyl, alkoxy-lower-alkyloxy, lower-alkylsulfinyl, lower-alkylsulfonyl, 2-methoxy-3-hydroxypropoxy, 2-hydroxy-3-phenylpropyl, amino-lower-alkyl, lower-alkylamino-lower-alkyl, di-lower-alkylamino-lower-alkyl, amino, lower-alkylamino, di-lower-alkylamino, arylamino, aryl, arylthio, aryloxy, aryl-lower-alkyl, heterocyclyl, heterocyclo-lower-alkyl, heterocyclylamino, heterocyclylthio, heterocyclyloxy, --CHO, --CH.sub.2 OH or --CH.sub.2 Cl; R.sup.5 to R.sup.8 are independently hydrogen, halogen, trifluoromethyl, lower-alkoxy, lower-alkylthio or cyano; R.sup.6 and R.sup.5 or R.sup.7 together are butadienyl, methylene-dioxy, ethylenedioxy or isopropylidenedioxy; X is --O-- or --S--; Y is --CHO, C.sub.1-4 -alkyl, --(CH.sub.2).sub.1-4 --Z--R.sup.9, --(CH.sub.2).sub.1-4 --OC(O)(CH.sub.2).sub.1-4 CH.sub.3, --(CH.sub.2).sub.1-4 OC(O)Het, --(CH.sub.2).sub.1-4 NHC(O)R.sup.10, --(CH.sub.2).sub.1-4 OCH.sub.2 CH(OH)CH.sub.2 OH and cyclic ketals thereof, --(CH.sub.2).sub.1-4 NR.sup.9 CH.sub.2 CH(OH)CH.sub.2 OH, --(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 SCH.sub.3, --(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 S(O)CH.sub.3, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 --Z H, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)R.sup.10, --(CH.sub.2).sub.1-4 NR.sup.9 (CH.sub.2).sub.1-4 Z H, --(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)Het, --(CH.sub.2).sub.0-3 CH(OH)R.sup.10, --(CH.sub.2).sub.0-3 CH(OH)(CH.sub.2).sub.1-4 Z H, --(CH.sub.2).sub.0-3 CH(OH)CH.sub.2 SCH.sub.3, --(CH.sub.2).sub.0-3 CH(OH)CH.sub. 2 S(O)CH.sub.3, --(CH.sub.2).sub.0-3 CH(OH)OCH.sub.2 CH.sub.2 OH, --(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 CH.sub.3, --(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 Z R.sup.11, --(CH.sub.2).sub.0-3 C(O)CH.sub.2 Hal, --(CH.sub.2).sub.1-4 Hal, --(CH.sub.2).sub.1-4 CN, --(CH.sub.2).sub.0-3 C(O)OR.sup.9, --OR.sup.12 or --SR.sup.12 ; R.sup.9 is hydrogen or C.sub.1-4 -alkyl; R.sup.10 is C.sub.1-4 -alkyl; R.sup.11 is hydrogen, C.sub.1-4 -alkanoyl or heterocyclylcarbonyl; R.sup.12 is C.sub.1-4 -alkyl or --(CH.sub.2).sub.0-4 -aryl; Z is --O--, --S-- or --NR.sup.9 --; Het is a heterocyclic residue; Hal is halogen; and n is 0 or 1; and salts thereof.
本发明涉及新型磺酰胺类化合物及其作为药物的用途。具体而言,本发明涉及以下式子的化合物:##STR1## 其中R.sup.1为氢、低碳基、低氧基、低硫基、卤素或三氟甲基;R.sup.2为氢、低碳基、卤素、低氧基、三氟甲基或--OCH.sub.2 COOR.sup.9 ;R.sup.3为氢、低碳基、卤素、低硫基、三氟甲基、低氧基或三氟甲氧基;R.sup.2和R.sup.3在一起为丁二烯基、甲亚苯二氧基、乙二醚基或异丙基亚甲基二氧基;R.sup.4为氢、低碳基、三氟甲基、低氧基、低硫基、羟基-低碳基、羟基-低氧基、羟基-低氧基-低碳基、羟基-低氧基-低氧基、低氧基-低碳基、低氧基-低氧基-低碳基、低碳基亚砜基、低碳基磺酰基、2-甲氧基-3-羟基丙氧基、2-羟基-3-苯基丙基、氨基-低碳基、低碳基氨基-低碳基、二-低碳基氨基-低碳基、氨基、低碳基氨基、二-低碳基氨基、芳基氨基、芳基、芳基硫基、芳基氧基、芳基-低碳基、杂环基、杂环-低碳基、杂环基氨基、杂环基硫基、杂环基氧基、--CHO、--CH.sub.2 OH或--CH.sub.2 Cl;R.sup.5至R.sup.8独立地为氢、卤素、三氟甲基、低氧基、低硫基或氰基;R.sup.6和R.sup.5或R.sup.7在一起为丁二烯基、亚甲基二氧基、乙二醚基或异丙基亚甲基二氧基;X为--O--或--S--;Y为--CHO、C.sub.1-4 -低碳基、--(CH.sub.2).sub.1-4 --Z--R.sup.9、--(CH.sub.2).sub.1-4 --OC(O)(CH.sub.2).sub.1-4 CH.sub.3、--(CH.sub.2).sub.1-4 OC(O)Het、--(CH.sub.2).sub.1-4 NHC(O)R.sup.10、--(CH.sub.2).sub.1-4 OCH.sub.2 CH(OH)CH.sub.2 OH及其环状缩酮、--(CH.sub.2).sub.1-4 NR.sup.9 CH.sub.2 CH(OH)CH.sub.2 OH、--(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 SCH.sub.3、--(CH.sub.2).sub.1-4 OCH.sub.2 CH.sub.2 S(O)CH.sub.3、--(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 --Z H、--(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)R.sup.10、--(CH.sub.2).sub.1-4 NR.sup.9 (CH.sub.2).sub.1-4 Z H、--(CH.sub.2).sub.1-4 O(CH.sub.2).sub.1-4 OC(O)Het、--(CH.sub.2).sub.0-3 CH(OH)R.sup.10、--(CH.sub.2).sub.0-3 CH(OH)(CH.sub.2).sub.1-4 Z H、--(CH.sub.2).sub.0-3 CH(OH)CH.sub.2 SCH.sub.3、--(CH.sub.2).sub.0-3 CH(OH)CH.sub.2 S(O)CH.sub.3、--(CH.sub.2).sub.0-3 CH(OH)OCH.sub.2 CH.sub.2 OH、--(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 CH.sub.3、--(CH.sub.2).sub.0-3 C(O)(CH.sub.2).sub.1-4 Z R.sup.11、--(CH.sub.2).sub.0-3 C(O)CH.sub.2 Hal、--(CH.sub.2).sub.1-4 Hal、--(CH.sub.2).sub.1-4 CN、--(CH.sub.2).sub.0-3 C(O)OR.sup.9、--OR.sup.12或--SR.sup.12;R.sup.9为氢或C.sub.1-4 -低碳基;R.sup.10为C.sub.1-4 -低碳基;R.sup.11为氢、C.sub.1-4 -烷酰基或杂环基羰基;R.sup.12为C.sub.1-4 -低碳基或--(CH.sub.2).sub.0-4 -芳基;Z为--O--、--S--或--NR.sup.9 --;Het为杂环残基;Hal为卤素;n为0或1;以及其盐。