1,1,1-三氟-4-甲基-2-(三氟甲基)戊烷-2,4-二醇 | 101931-57-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: 1,1,1-三氟-4-甲基-2-(三氟甲基)戊烷-2,4-二醇
• 英文名称: 1,1,1-Trifluoro-4-methyl-2-trifluoromethyl-pentane-2,4-diol
• 英文别名: 1,1,1-trifluoro-4-methyl-2-(trifluoromethyl)pentane-2,4-diol
• CAS: 101931-57-1
• 化学式: C₇H₁₀F₆O₂
• 分子量: 240.146
• InChiKey: BXXMNESHOLNUNS-UHFFFAOYSA-N

物化性质

• 沸点：
  204.9±35.0 °C(Predicted)
• 密度：
  1.396±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  丙酮 、 2-(溴甲基)六氟丙烷-2-醇 在 正丁基锂 作用下， 以 乙醚 、 正己烷 为溶剂， 反应 2.0h， 以79%的产率得到1,1,1-三氟-4-甲基-2-(三氟甲基)戊烷-2,4-二醇
  参考文献：
  名称：

  Facile preparation and synthetic applications of LiCH2C(CF3)2OLi

  摘要：

  Bromohydrin BrCH2C(CF3)(2)OH readily reacts with two equivalents of n-BuLi at -78 degreesC to produce the corresponding dilithium derivative LiCH2C(CF3)(2)OLi in high yield. This dilithiated derivative reacts selectively, acting as a C-nucleophile, with a variety of electrophiles such as R2PCl, carbonyl compounds, and epoxides, to give electron-deficient phosphines R2PCH2C(CF3)(2)OH, 1,3- and 1,4-diols, correspondingly. (C) 2002 Elsevier Science B.V. All rights reserved.

  DOI：

  10.1016/s0022-1139(02)00154-9

文献信息

• POLYMERIZABLE TERTIARY ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130189620A1

  公开（公告）日：2013-07-25

  The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.
• US9040222B2
  申请人：——

  公开号：US9040222B2

  公开（公告）日：2015-05-26