Pentaerythrit-divinylether | 757-49-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Pentaerythrit-divinylether
• 英文别名: 2,2-Bis(ethenoxymethyl)propane-1,3-diol
• CAS: 757-49-3
• 化学式: C₉H₁₆O₄
• 分子量: 188.224
• InChiKey: SUFSXWBMZQUYOC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  13
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.56
• 拓扑面积：
  58.9
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  Pentaerythrit-divinylether 在 platinum(IV) oxide 氢气 作用下， 以 乙醇 为溶剂， 生成 Pentaerythrit-diethylether
  参考文献：
  名称：

  Vinylation of Pentaerythritol

  摘要：

  DOI：

  10.1021/jo01049a031
• 作为产物：
  描述：

  季戊四醇 、 乙炔 在 氢氧化钾 作用下， 生成 Pentaerythrit-divinylether
  参考文献：
  名称：

  Vinylation of Pentaerythritol

  摘要：

  DOI：

  10.1021/jo01049a031

文献信息

• Fluorine-containing acetophenone derivative, surface layer material containing the same as photo initiator, article with composite hard coat layer, and method for forming composite hard coat layer
  申请人：TDK CORPORATION

  公开号：US20040181087A1

  公开（公告）日：2004-09-16

  The present invention provides a new fluorine-containing acetophenone derivative useful as a photo initiator, and a surface layer material containing the fluorine-containing acetophenone derivative. The present invention provides inexpensively an article with a hard coat excellent in anti-staining property, lubricity, scratch resistance and abrasion resistance, and provides a method for forming the hard coat. A fluorine-containing acetophenone derivative represented by the following general formula (I): 1 wherein R 1 , R 2 and R 3 each independently represent an organic group other than aryl group, a hydrogen atom, a halogen atom or a hydroxyl group, provided that the following case does not take place: all of R 1 , R 2 and R 3 are simultaneously hydrogen atoms; and any two of R 1 , R 2 and R 3 may be linked to each other to form a ring, and R 4 represents a fluorine-containing organic group. Hard coat layer 2 is formed to contact a surface of an article, and a fluorine-containing surface layer 3 using the compound is formed to contact a surface of the hard coat layer 2.

  本发明提供了一种新的含氟乙酰苯酮衍生物，可用作光引发剂，以及含有该含氟乙酰苯酮衍生物的表面层材料。本发明提供了一种制备具有优异的防污染性、润滑性、耐刮擦性和耐磨性硬质涂层的物品的廉价方法，并提供了一种形成硬质涂层的方法。所述含氟乙酰苯酮衍生物由下述通式（I）表示：1其中，R1、R2和R3各自独立地表示除芳族基、氢原子、卤素原子或羟基外的有机基，前提是不发生以下情况：R1、R2和R3全部同时为氢原子；且R1、R2和R3中的任意两个可以连接在一起形成环，R4表示含氟有机基。硬质涂层层2形成以接触物品表面，并且使用该化合物形成含氟表面层3以接触硬质涂层层2的表面。
• CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
  申请人：OSAKA UNIVERSITY

  公开号：US20170052449A1

  公开（公告）日：2017-02-23

  A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray that is nonionizing radiation having a wavelength greater than the wavelength of the nonionizing radiation for the patternwise exposing and greater than 200 nm. The chemically amplified resist material comprises a base component, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The generative component comprises a radiation-sensitive sensitizer generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (A).

  一种图案形成方法包括将一种化学放大型光刻胶材料制成的感光树脂组成物的预定区域图案暴露于第一种放射性射线中，该放射性射线是电离辐射或波长不大于400 nm的非电离辐射。图案化暴露的光刻胶材料膜被洪水式暴露于第二种放射性射线中，该放射性射线是波长大于图案化暴露的非电离辐射的波长和大于200 nm的非电离辐射。该化学放大型光刻胶材料包括基础组分和能够在暴露时生成辐射敏感的敏化剂和酸的生成组分。生成组分包括辐射敏感的敏化剂生成剂。辐射敏感的敏化剂生成剂包括由式(A)表示的化合物。
• [EN] PROCESS FOR PRODUCING ETHER COMPOUNDS IN PRESENCE OF A COPPER (II) SALT<br/>[FR] PROCEDE DE PRODUCTION DE COMPOSES D'ETHER EN PRESENCE D'UN SEL DE CUIVRE(II)
  申请人：SHOWA DENKO KK

  公开号：WO2003106024A1

  公开（公告）日：2003-12-24

  A process for producing allylic ether compounds in presence of a catalyst comprising at least one Cu(II) salt by reaction of an allylic alcohol with either itself or another alcohol.

  一种在至少含有一种Cu(II)盐催化剂存在下，通过将烯丙醇与自身或另一种醇反应制备烯丙醚化合物的方法。
• CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN
  申请人：Kodama Kunihiko

  公开号：US20110059302A1

  公开（公告）日：2011-03-10

  A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.

  提供了一种可治愈的印迹组合物，其在图案化和线边粗糙度方面表现出色。该可固化的印迹组合物包括至少一种聚合单体（A）和至少一种光聚合引发剂（B）。聚合单体（A）包括至少两种含氟基团，所选基团为氟烷基或氟烷基醚基，其中每两个含氟基团通过具有至少两个碳原子的连接基团相互连接。
• Process for producing polymer having crosslinkable silyl group and curable composition
  申请人：——

  公开号：US20040220364A1

  公开（公告）日：2004-11-04

  A process for producing a crosslinkable silyl group-containing polymer which is excellent in oil resistance, heat resistance, weatherability, low staining properties, and compression set characteristics, includes the steps of radically polymerizing a vinyl monomer in the presence of a thiocarbonylthio group-containing compound with a specific structure, and introducing crosslinkable silyl groups. Also provided is a curable composition which contains the polymer and which is easy to handle.

  一种生产含有交联硅基聚合物的方法，该聚合物具有优异的耐油性、耐热性、耐候性、低染色性和压缩永久变形特性，该方法包括在具有特定结构的硫代氨基羰基硫基化合物的存在下，自由基聚合乙烯单体，并引入可交联的硅基团。此外，还提供了一种易于处理的含有该聚合物的可固化组合物。