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| 1367367-99-4

中文名称
——
中文别名
——
英文名称
——
英文别名
——
化学式
CAS
1367367-99-4
化学式
C10H23N2O2
mdl
——
分子量
203.305
InChiKey
HWGJHSABAKCDLG-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.44
  • 重原子数:
    14.0
  • 可旋转键数:
    4.0
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    46.61
  • 氢给体数:
    1.0
  • 氢受体数:
    3.0

反应信息

  • 作为产物:
    描述:
    N,N-二乙基乙酰胺亚硝基叔丁烷2-Ethoxy-thioxanthon 作用下, 以 乙腈 为溶剂, 生成
    参考文献:
    名称:
    The photoreactions of simple amides with NO. Gaining insight into radical bio-damages through an EPR case study
    摘要:
    Eight simple amides have been subjected to UV irradiation in the presence of either MNP or NO. In all cases radical species were generated: these were detected by means of EPR spectroscopy in the form of different nitroxides resulting from the trapping of the primary radicals. NO acted as a double spin trap, scavenging a radical to afford a diamagnetic nitroso derivative that in turn acted as trap towards another radical unit. As amido-groups are present in components of skin tissue and may be present in many therapeutic or cosmetic products used as skin sunscreen, and NO is a ubiquitous endogenous reactive species, the nitroxides detected in the present studies might participate in radical processes triggered by sun exposure and resulting in damages, even severe, of biological tissues. (C) 2012 Elsevier Ltd. All rights reserved.
    DOI:
    10.1016/j.tet.2012.01.066
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