8-methyl-6-oxa-bicyclo[3.2.1]octan-7-one | 90199-10-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 8-methyl-6-oxa-bicyclo[3.2.1]octan-7-one
• 英文别名: 8-Methyl-6-oxa-bicyclo[3.2.1]octan-7-on；8-Methyl-6-oxabicyclo[3.2.1]octan-7-one
• CAS: 90199-10-3
• 化学式: C₈H₁₂O₂
• 分子量: 140.182
• InChiKey: WZVFURZQODWKBJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  8-methyl-6-oxa-bicyclo[3.2.1]octan-7-one 、 氢溴酸 生成 alkaline earth salt of/the/ methylsulfuric acid
  参考文献：
  名称：

  CCVIII.—6-羟基邻甲苯甲酸的还原

  摘要：

  DOI：

  10.1039/ct9099501883
• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 生成 8-methyl-6-oxa-bicyclo[3.2.1]octan-7-one
  参考文献：
  名称：

  CCVIII.—6-羟基邻甲苯甲酸的还原

  摘要：

  DOI：

  10.1039/ct9099501883

文献信息

• CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Ichikawa Koji

  公开号：US20100330497A1

  公开（公告）日：2010-12-30

  The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth) acrylic monomer (a1) having C 5-20 alicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth) acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth) acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).

  本发明提供了一种抗蚀剂组合物，可提供具有CD均匀性和对焦余地的抗蚀剂图案。一种化学放大光阻组合物包括树脂（A）和酸发生剂（B），其中树脂（A）至少包含以下共聚物（A1）的一部分或全部：通过聚合至少得到的（甲基）丙烯酸酯单体（a1），其具有C5-20萜环烃基团，通过酸的作用在水性碱溶液中变得溶解；具有含羟基的金刚烷基团的（甲基）丙烯酸酯单体（a2）；以及具有内酯环的（甲基）丙烯酸酯单体（a3），且共聚物（A1）的重均分子量为2500或更高但不超过5000，且共聚物（A1）的含量相对于树脂（A）的100质量份不少于50质量份。
• Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11061326B2

  公开（公告）日：2021-07-13

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid: wherein n1, n2, Rc1, and Rc are defined in claim 1.

  一种化学放大正型光敏树脂组合物，当使用该组合物在具有金属表面的基板的金属表面上形成作为电镀物品模板的抗蚀图案时，能够抑制非抗蚀部分底部（靠近支撑物表面的一面）的宽度比顶部（靠近抗蚀层表面的一面）窄的 "起脚 "现象的发生。在组合物中加入具有下图所示式（C）的巯基化合物，该化合物包括一种酸发生器和一种树脂，前者在受到辐照活性射线或辐射时产生酸，后者在酸的作用下在碱中的溶解度增加： 其中 n1、n2、Rc1 和 Rc 在权利要求 1 中定义。
• AXMEDOV, A. A.;RUSTAMOV, M. A.;OSMANOV, EH. O., ZH. ORGAN. XIMII, 25,(1990) N, S. 1034-1039
  作者：AXMEDOV, A. A.、RUSTAMOV, M. A.、OSMANOV, EH. O.

  DOI：——

  日期：——
• ISMAJLOV, A. G.;SADYXOV, I. D.;RUSTAMOV, M. A.;AXMEDOV, A. A., AZERB. XIM. ZH., 1984, N 5, 84-86
  作者：ISMAJLOV, A. G.、SADYXOV, I. D.、RUSTAMOV, M. A.、AXMEDOV, A. A.

  DOI：——

  日期：——
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110091807A1

  公开（公告）日：2011-04-21

  The present invention provides a photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R 3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A 1 represents a single bond, —(CH 2 ) g —CO—O—* or —(CH 2 ) h —O—CO—(CH 2 ) i —CO—O—* wherein g, h and i each independently represent an integer of −1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.