An organic silane compound for forming a Si-containing film by plasma CVD is provided. The silane compound contains 2 or more silicon atoms bonded by an intervening straight chain or branched oxygen-containing hydrocarbon chain having 4 to 8 carbon atoms containing a bond represented by C
p
—O—C
q
wherein p and q independently represent number of carbon atoms with the proviso that 2≦p≦6 and 2≦q≦6 and the carbon chains do not contain an unsaturated bond which conjugates with the oxygen atom, wherein all of the 2 or more silicon atoms has 1 or more hydrogen atom or an alkoxy group having 1 to 4 carbon atoms.
提供了一种有机
硅烷化合物,用于通过等离子体CVD形成含
硅膜。该
硅烷化合物包含2个或更多
硅原子,由介于直链或分支氧含量碳氢链之间的键合而成,其中含有一个由Cp-O-Cq表示的键,其中p和q独立地表示碳原子数,但须满足2≦p≦6和2≦q≦6,且碳链不含有与氧原子共轭的不饱和键,其中所有的2个或更多
硅原子具有1个或更多氢原子或具有1到4个碳原子的烷氧基团。