A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD): 
wherein, R1, R2, R3 and R4 are each independently C1-4 alkyl optionally carrying one or more fluorine substituents; and m is an integer in the range of 1 to 3.
                            一种具有改进质量的
铜氨基烷氧化物复合物(I)可通过
金属有机
化学气相沉积(MOCVD)形成
铜薄膜:其中,R1、R2、R3和R4分别独立地是C1-4烷基,可选择地携带一个或多个
氟取代基;m是在1到3范围内的整数。