Polymer, resist composition and patterning process
申请人:——
公开号:US20010003772A1
公开(公告)日:2001-06-14
A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.
Silacycles as templates for acyclic diastereoselection
作者:John A. Soderquist、Alvin Negron
DOI:10.1016/s0040-4039(98)02200-x
日期:1998.12
The 4-substituted silacyclohex-3-enes (3) prepared from the vinyl triflate (9) derived from 1,1-dimethyl-1-silacyclohexan-4-one (1) and higher-order organocuprates provides a versatile template for the construction of non-racemic 3-methyl-4-penten-1-ol (6). Through asymmetric hydroboration, 3 affords the requisite β-hydroxysilane (4) with the ideal geometry to undergo elimination to the chiral acyclic