A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.
一种具有特定环状含
硅基团的高分子轴承是新颖的。以该高分子为基础
树脂的抗蚀剂组合物对高能辐射敏感,在小于300纳米的波长下具有良好的敏感性和分辨率,并具有高抗氧等离子体刻蚀性能。该抗蚀剂组合物适用于微细图案制造,用于制造超大规模集成电路。