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1-cyclopentylcyclohexanol | 16189-53-0

中文名称
——
中文别名
——
英文名称
1-cyclopentylcyclohexanol
英文别名
1-Cyclopentyl-cyclohexan-1-ol;1-Cyclopentylcyclohexan-1-ol
1-cyclopentylcyclohexanol化学式
CAS
16189-53-0
化学式
C11H20O
mdl
——
分子量
168.279
InChiKey
MTDYFOATOPDMQZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3
  • 重原子数:
    12
  • 可旋转键数:
    1
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

反应信息

  • 作为反应物:
    描述:
    甲酸1-cyclopentylcyclohexanol硫酸 作用下, 反应 1.0h, 以87%的产率得到1-cyclopentylcyclohexane-1-carboxylic acid
    参考文献:
    名称:
    Rao, R. R.; Bhattacharya, S., Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 1981, vol. 20, # 3, p. 207 - 209
    摘要:
    DOI:
  • 作为产物:
    描述:
    环己酮 、 cyclopentylmagnesium iodide 以 乙醚 为溶剂, 反应 0.5h, 以70%的产率得到1-cyclopentylcyclohexanol
    参考文献:
    名称:
    Rao, R. R.; Bhattacharya, S., Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 1981, vol. 20, # 3, p. 207 - 209
    摘要:
    DOI:
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文献信息

  • ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
    申请人:Kinsho Takeshi
    公开号:US20100304295A1
    公开(公告)日:2010-12-02
    An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
    一种酸敏感酯单体具有螺环结构,其化学式如下(1),其中Z是具有可聚合双键的一价基团,X是形成环戊烷环己烷或诺邦烷环的二价基团,R2是H或一价碳氢基团,R3和R4是H或一价碳氢基团,或者R3和R4一起表示形成环戊烷环己烷环的二价基团,n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性,因此可以用于制备具有高分辨率的抗蚀组合物。
  • Polymerizable monomers and method of polymerizing the same
    申请人:Align Technology, Inc.
    公开号:US10781274B2
    公开(公告)日:2020-09-22
    Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
    本文提供了可光聚合单体(可选择用作基于高温光刻技术的光聚合工艺中的活性稀释剂)、使用所述可光聚合单体生产聚合物的方法、由此生产的聚合物以及包含这些聚合物的正畸器械。
  • NEUE POLYMERISIERBARE MONOMERE UND DEREN VERWENDUNG ALS REAKTIVVERDÜNNER IN HÄRTBAREN ZUSAMMENSETZUNGEN
    申请人:Align Technology, Inc.
    公开号:EP3564206B1
    公开(公告)日:2020-11-04
  • Storage stable azadirachtin pesticide formulation
    申请人:Sanson Dale R.
    公开号:US20080090780A1
    公开(公告)日:2008-04-17
    A storage stable, efficacious pesticide formulation is provided that is dilutable by the user and contains azadirachtin (AZA) and a pyrethrin or pyrethroid (PYR), and optionally an aprotic solvent and non-ionic, substantially water-free emulsifier. A sufficient amount of the PYR is provided to complex with the AZA A on opposite sides of the molecular structure thereof, thereby preventing rearrangement of the AZA A molecule in the presence of moisture that would result in hydrolysis and decomposition of AZA A. The AZA-PYR combination is sufficiently chemically stable such that less than 10% of the AZA A is decomposed when the formulation is subjected to an accelerated aging test for 30 days at 40° C. in a sealed container. The molar ratio of PYR to AZA A is preferably within the range of 0.5/1-10.5/1, more preferably within the range of 1.5/1-7/1, and most preferably with the range of 3/1-6/1. A solvent, when provided, should be in the range of about 70% to about 90% by weight based on the weight of the formulation, and the emulsifier should be within the range of about 0% to about 20%.
  • POLYMERIZABLE MONOMERS AND METHOD OF POLYMERIZING THE SAME
    申请人:Align Technology, Inc.
    公开号:US20200040113A1
    公开(公告)日:2020-02-06
    Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
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