申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US06027854A1
公开(公告)日:2000-02-22
A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining alcoholic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group, alcoholic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is a divalent C.sub.1 -C.sub.18 hydrocarbon group which may have a hetero atom, R.sup.4 and R.sup.5 are H or monovalent C.sub.1 -C.sub.18 hydrocarbon groups which may have a hetero atom, x and y are integers satisfying x+y.ltoreq.5, x', y' and z' are integers satisfying x'+y'+z'.ltoreq.5, p, q and r are numbers satisfying 0.ltoreq.p.ltoreq.0.4, 0.ltoreq.q.ltoreq.0.4, 0.01.ltoreq.p+q.ltoreq.0.8, and p+q+r=1. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity, high resolution, a wide latitude of exposure, and process adaptability and forms resist patterns having plasma etching resistance and heat resistance.
提供了一种聚合物,其由公式(1)的重复单元组成,其中苯酚羟基和/或醇羟基和/或羧基的一些氢原子被酸敏感基团取代。该聚合物与具有C-O-C键的交联基团交联,所述交联基团由剩余的一些醇羟基和/或羧基与烯基醚化合物或卤代烷基醚化合物反应而成。酸敏感基团和交联基团的总量平均为苯酚羟基,醇羟基和羧基的全部的0摩尔%至80摩尔%。该聚合物的分子量为1,000-500,000。其中,R1为H或甲基,R2为C1-C8烷基,R3为二价的C1-C18碳氢基团,可能具有杂原子,R4和R5为H或单价的C1-C18碳氢基团,可能具有杂原子,x和y为满足x+y≤5的整数,x',y'和z'为满足x'+y'+z'≤5的整数,p,q和r为满足0≤p≤0.4,0≤q≤0.4,0.01≤p+q≤0.8和p+q+r=1的数字。该聚合物作为基础树脂的化学增感正性光阻组合物具有高灵敏度、高分辨率、广泛的曝光容限和工艺适应性,并形成具有等离子体刻蚀抗性和耐热性的光阻图案。