POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER, AND POLYMERIC COMPOUND
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20160376233A1
公开(公告)日:2016-12-29
A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0):
Z
01
to Z
04
each independently represent a substituent having electron withdrawing properties, Rb
21
and Rb
22
each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb
1
represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0
−
represents an organic anion.
一种正型抗蚀组合物,曝光后生成酸,其在碱性显影溶液中的溶解度在酸的作用下增加,该组合物包括一种基材组分,在酸的作用下在碱性显影溶液中的溶解度增加;以及由以下一般式(m0)表示的化合物:Z01至Z04分别独立表示具有电子吸引性的取代基,Rb21和Rb22分别独立表示烷基基团、可能具有取代基的脂环烃基团或羟基,Rb1表示可能具有取代基的芳基、烷基或烯基,n1和n2表示0至3的整数,X0−表示有机阴离子。