dodecyloxy-acetaldehyde | 202408-12-6

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: dodecyloxy-acetaldehyde
• 英文别名: Dodecyloxy-acetaldehyd；n-Dodecyloxyacetaldehyd；2-Dodecoxyacetaldehyde
• CAS: 202408-12-6
• 化学式: C₁₄H₂₈O₂
• 分子量: 228.375
• InChiKey: YOYPDRZPKHTGSH-UHFFFAOYSA-N

物化性质

• 熔点：
  16-17 °C
• 沸点：
  155-156 °C(Press: 9 Torr)
• 密度：
  1.44 g/cm3(Temp: 21 °C)

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  16
• 可旋转键数：
  13
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  dodecyloxy-acetaldehyde 在 lithium aluminium deuteride 作用下， 以 乙醚 为溶剂， 以92%的产率得到2-dodecyloxy-(1-d2)-ethane-1-ol
  参考文献：
  名称：

  合成2 H标记的烷氧基乙基磷酸二酯（AZT）衍生物以进行固态2 H-NMR研究†

  摘要：

  合成了两个具体的2个H标记的烷氧基乙基磷酸二酯AZT衍生物9和14。结合物14的[ 2 H]固态nmr实验证明了其在研究与模型或生物膜的相互作用中的有用性。

  DOI：

  10.1002/jhet.5570330316
• 作为产物：
  描述：

  乙二醇单十二烷基醚 在 三氟乙酸吡啶 、 二甲基亚砜 、 N,N'-二环己基碳二亚胺 作用下， 以 甲苯 为溶剂， 反应 48.0h， 以23%的产率得到dodecyloxy-acetaldehyde
  参考文献：
  名称：

  Contact Allergens from Surfactants. Atmospheric Oxidation of Polyoxyethylene Alcohols, Formation of Ethoxylated Aldehydes, and Their Allergenic Activity

  摘要：

  Ethoxylated surfactants are susceptible to oxidation upon air exposure. We have previously studied the rate of peroxidation and formaldehyde formation in the chemically well-defined ethoxylated alcohol C12H25(OCH2CH2)(5)OH. Formaldehyde is a common cause of contact allergy. The aim of the present study was to identify other oxidation products that could be formed upon air exposure of the ethoxylated alcohol and to determine their allergenic activity. It was shown that air oxidation of C12H25(OCH2CH2)(5)OH gave all the theoretically possible aldehydes of the general formula C12H25(OCH2 CH2)(n)OCH2CHO (n = 0-4) and that the major oxidation product was C12H25(OCH2CH2)(4)OCH2CHO, dodecyltetraoxyethyleneoxyacetaldehyde. The structure elucidation and synthesis of these aldehydes are here presented for the first time. The major aldehyde was shown to be a contact allergen with the same sensitizing capacity as that of formaldehyde. A dose-response relationship was observed in the sensitization studies. The allergens were formed from the surfactant itself and the skin reactions cannot be explained due to any impurities that may be present in a technical quality of the surfactant. Cases of allergic contact dermatits to ethoxylated surfactants have been reported. To avoid the formation of allergenic oxidation products it is important to control the conditions for storage, handling, and transportation of ethoxylated surfactants.

  DOI：

  10.1021/js9704036

文献信息

• Use of n,n-dialkylhydroxylamines and their preparation
  申请人：CIBA-GEIGY AG

  公开号：EP0286596A2

  公开（公告）日：1988-10-12

  The compounds of the formula (I) wherein R₁ and R₂ are independently alkyl of 8 to 36 carbon atoms, are useful for stabilizing a poly(arylene sulfide) resin, a modified poly­styrene or a polymer containing a diene component against thermal, oxidative or actinic degradation. N,N-Dialkylhydroxylamines of the formula (I) can be prepared by an improved process involving a reverse Michael reaction of the N-oxides of the corresponding β-dialkylaminopropionic esters, amides or nitriles or of β-dialkylaminosuccinyl esters or imides. N,N-Dialkylhydroxylamines of the formula (I) can also be prepared by an improved process involving the direct oxidation of the corresponding N,N-dialkylamines with aqueous hydrogen peroxide in a lower alkanol solvent.

  式 (I) 的化合物 其中 R₁和 R₂ 独立地为 8 至 36 个碳原子的烷基，可用于稳定聚（芳基硫醚）树脂、改性聚苯乙烯或含有二烯成分的聚合物，防止热降解、氧化降解或放热降解。 式 (I) 的 N,N-二烷基羟胺可通过改进的工艺制备，该工艺涉及相应的 β-二烷基氨基丙酸酯、酰胺或腈或β-二烷基氨基琥珀酰酯或酰亚胺的 N-氧化物的逆迈克尔反应。 式 (I) 的 N,N-二烷基羟胺还可以通过一种改进的工艺制备，即在低级烷醇溶剂中用过氧化氢水溶液直接氧化相应的 N,N-二烷基胺。
• Top-layer membrane formation composition and method for forming resist pattern using same
  申请人：AZ Electronic Materials (Luxembourg) S.a.r.l.

  公开号：US10268117B2

  公开（公告）日：2019-04-23

  [Object] To provide compositions for forming a top coat layer capable of forming patterns with an excellent roughness and pattern shape in a pattern formation method by exposure to extreme ultraviolet rays, and a pattern formation method using the composition. [Means for solving problem] Provided are compositions for forming a top coat layer comprises an aromatic compound having an aromatic hydroxyl group and an aqueous solvent; and a method of forming patterns by applying the composition onto the resist surface and subjecting the resultant to exposure and development. This composition can further comprise binders.

  [目的]提供一种用于形成面漆层的组合物，该组合物能够在图案形成方法中通过暴露于极强紫外线形成具有优异粗糙度和图案形状的图案，并提供一种使用该组合物的图案形成方法。 [解决问题的方法]本发明提供了用于形成面漆层的组合物，该组合物包含具有芳香羟基的芳香族化合物和水性溶剂；以及通过将该组合物涂在抗蚀剂表面并使其进行曝光和显影来形成图案的方法。这种组合物还可以包括粘合剂。
• Sabetay, Bulletin de la Societe Chimique de France, 1929, vol. <4> 45, p. 1167
  作者：Sabetay

  DOI：——

  日期：——
• FR37584
  申请人：——

  公开号：——

  公开（公告）日：——
• Rotbart, Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1933, vol. 196, p. 2015
  作者：Rotbart

  DOI：——

  日期：——