Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers
申请人:Crawford Karl Michael
公开号:US20070207413A1
公开(公告)日:2007-09-06
The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
本发明涉及一种新型不饱和多环化合物,其中包含两个氟醇取代基。本发明还涉及从这种不饱和多环化合物衍生出的同聚物和共聚物。这些共聚物可用于光影像组合物,特别是用于制造半导体器件的光阻组合物(正像和/或负像)。这些聚合物在高紫外线透明度(特别是在短波长,例如157nm处)的光阻组合物中特别有用,可用作光阻的基础树脂,潜在地可用于许多其他应用。