我们报告了由 Cu 催化剂控制的叔烷基自由基对两种不同烯烃的序列调节自由基加成,我们将其称为“原子转移自由基加成-取代”反应。α-溴代羰基化合物(例如叔烷基自由基源)与甲基丙烯酸酯和苯乙烯的反应以顺序调节的方式发生,得到相应的具有跳过季碳中心的三组分产物。我们的方法为如何在受调节的脂肪链合成过程中控制叔烷基自由基的反应性提供了新的见解。
Provided is a production method whereby corresponding carboxylic acid esters can be obtained from a variety of carboxylic acids at a high yield, even under conditions using a simple reaction operation and little catalyst and even if the amount of substrate used is theoretical. A production method for carboxylic acid ester, whereby a prescribed diester dicarbonate, carboxylic acid, and alcohol are reacted in the presence of at least one type of magnesium compound and at least one type of alkali metal compound.
Preparation and Enzymatic Hydrolysis of Polymers Anchoring Biphenyl-2-ol
作者:Tomomichi Ishikawa、Youji Tanaka
DOI:10.1246/bcsj.58.1182
日期:1985.4
Polymers anchoring fungicidal biphenyl-2-ol(BPOL) were prepared by the polymerization and copolymerization of 2-biphenylyl methacrylate(BPMA) with various comonomers such as styrene, vinyl acetate, 2-hydroxyethyl methacrylate, N-methacryloylglycine, and N-methacryloyl-Dl-alanine. The reactivity ratios of BPMA with the comonomers were evaluated. The α-chymotrypsin-catalyzed hydrolysis of the polymers was also studied. The release of BPOL from the polymers was represented by means of the Michaelis constant Km and the catalytic-rate constant kcat. The BPMA homopolymer gave higher Km and kcat values than the copolymers, and the copolymers with a higher content of substrate units underwent cleavage more readily. It was found that the hydrolysis of the polymeric substrates is affected by the structure and character of the comonomer rather than the arrangement order of the repeating monomer units in the polymer sequence.
通过甲基丙烯酸 2-联苯酯(BPMA)与苯乙烯、醋酸乙烯、甲基丙烯酸 2-羟乙基酯、N-甲基丙烯酰基甘氨酸和 N-甲基丙烯酰基-Dl-丙氨酸等多种共聚单体的聚合和共聚,制备了锚定有杀真菌联苯-2-醇(BPOL)的聚合物。对 BPMA 与共聚单体的反应比率进行了评估。此外,还研究了聚合物在 α-糜蛋白酶催化下的水解情况。BPOL 从聚合物中的释放是通过迈克尔常数 Km 和催化速率常数 kcat 来表示的。BPMA 均聚物的 Km 值和 kcat 值均高于共聚物,而底物单元含量较高的共聚物更容易发生裂解。研究发现,聚合物底物的水解受共聚单体的结构和特性而非聚合物序列中重复单体单元的排列顺序的影响。
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD
申请人:Fujii Kana
公开号:US20120003586A1
公开(公告)日:2012-01-05
Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation:
wherein each of R
1
and R
11
independently represents a hydrogen atom or an alkyl group which may have a substituent, and R
12
represents a phenyl group which may have a substituent.
CURABLE COMPOSITION AND PROCESS FOR PRODUCTION OF ORGANOSILICON COMPOUND
申请人:TOAGOSEI CO., LTD.
公开号:US20130149455A1
公开(公告)日:2013-06-13
The present curable composition comprises an organosilicon compound produced by hydrolysis copolycondensation of (A) a silicon compound R
0
Si(R
1
)
n
X
1
3-n
[wherein R
0
represents a (meth)acryloyl group; and X
1
represents a hydrolyzable group] and (B) a silicon compound SiY
1
4
[wherein Y
1
represents a siloxane-bond forming group] under an alkaline condition at a ratio of compound (A) to compound (B) of 1:(0.3 to 1.8) by mol. The present process for producing an organosilicon compound comprises a reaction process of conducting alcohol exchange reaction of a silicon compound SiY
2
4
[wherein Y
2
represents a siloxane-bond forming group] in 1-propanol to produce a composition; and a condensation process of adding a silicon compound R
0
Si(R
1
)
n
X
2
3-n
[wherein R
0
represents a (meth)acryloyl group; and X
2
represents a hydrolyzable group] to the composition to perform the hydrolysis copolycondensation of the silicon compounds under alkaline conditions.
A recording material contains an electron donating leuco dye and, as an electron accepting compound, a salicylic acid derivative having an alkyl group, an alkoxy group or an aryloxy group as a substituent or a metal salt thereof. The recording material has good color developability, working preservability and stability.