Atom-Economic, Metal- and Halogen-Free Synthesis of Podands: α,ω-Diphosphines and Their Chalcogenides Separated by Alkane Diol Spacers
摘要:
Secondary phosphines and phosphine chalcogenides add to the divinyl ether of alpha,omega-alkane diols regio- and chemoselectively under free-radical conditions (UV irradiation or AIBN, 2:1 reactants molar ratio) to give anti-Markovnikov diadducts in good to excellent yields (65-98%).
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040167322A1
公开(公告)日:2004-08-26
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
Nucleophilic Addition to Acetylenes in Superbasic Catalytic Systems: XIV. Vinilation of Diols in a System CsF-NaOH
作者:L. A. Oparina、M. Ya. Khil’ko、N. A. Chernyshova、S. I. Shaikhudinova、L. N. Parshina、Th. Preiss、J. Henkelmann、B. A. Trofimov
DOI:10.1007/s11178-005-0223-x
日期:2005.5
A new catalytic system CsF-NaOH was developed for the synthesis of mono- and divinyl ethers of alkanediols exceeding in efficiency KOH. The nucleophilic addition of diols to acetylene in the presence of this system occurs both at enhance pressure (without solvent, 140–160°C) and atmospheric pressure (in DMSO medium, 100°C) of acetylene. Conditions were established of a selective preparation in a high yield of divinyl ethers from diols.
Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
申请人:——
公开号:US20030180653A1
公开(公告)日:2003-09-25
A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C
1-4
alkyl or alkoxy, G is SO
2
or CO, R
3
is C
1-10
alkyl or C
6-14
aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.
1
Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040033432A1
公开(公告)日:2004-02-19
Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.
reaction that typically occurs in the vinylation of diols. In addition, the thermodynamically preferred transesterification reaction leading to the acetate esters and bis-esters was completely suppressed. DFT calculations revealed an iridium-acetate complex as the active catalytic species and they disclosed the importance of the carbonyl group of vinylacetate for the formation of a six-membered cyclic