1-cyclohexyloxyethyl methacrylate | 143556-62-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-cyclohexyloxyethyl methacrylate
• 英文别名: MACHVE；methacrylic acid-(1-cyclohexyloxy-ethyl ester)；Methacrylsaeure-(1-cyclohexyloxy-aethylester)；1-cyclohexyloxyethyl 2-methylprop-2-enoate
• CAS: 143556-62-1
• 化学式: C₁₂H₂₀O₃
• 分子量: 212.289
• InChiKey: XXSDRURBACQHHW-UHFFFAOYSA-N

物化性质

• 沸点：
  114-115 °C(Press: 20 Torr)
• 密度：
  0.9776 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  15
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  1-cyclohexyloxyethyl methacrylate 、 3,4-环氧环己基甲基甲基丙烯酸酯 、 甲基丙烯酸羟乙酯 、 2,2'-Azobis(methyl 2-methylpropanate) 在 氮气 、 二乙二醇二甲醚 作用下， 以 正庚烷 、 4-甲基-2-戊酮 为溶剂， 反应 6.0h， 以obtaining a diethylene glycol dimethyl ether solution of polymer A-5 (1-cyclohexyloxyethyl methacrylate/3,4-epoxycyclohexylmethyl methacrylate/2-hydroxyethyl methacrylate)的产率得到1-Cyclohexyloxyethyl methacrylate 3,4-epoxycyclohexylmethyl methacrylate 2-hydroxyethyl methacrylate
  参考文献：
  名称：

  Positive photosensitive resin composition and method of forming cured film from the same

  摘要：

  根据一种实施例，一种正向光敏树脂组合物包括以下成分：含有特定丙烯酸基结构单元的树脂，当其解离基团解离时生成羧基，该树脂在碱性溶液中不溶或难溶，但当其酸性解离基团解离时，变得可溶于碱性溶液；含有来源于含有环氧基的自由基聚合单体的结构单元的树脂；含有分子中两个或两个以上环氧基的化合物，但不包括含有来源于含有环氧基的自由基聚合单体的结构单元的树脂；以及一种在波长为300纳米或更长的光谱范围内接受光照后生成酸的化合物。

  公开号：

  US08771907B2
• 作为产物：
  描述：

  环己醇 在 氢氧化钾 作用下， 150.0 ℃ 、1.47 MPa 条件下， 生成 1-cyclohexyloxyethyl methacrylate
  参考文献：
  名称：

  Schostakowskii et al., Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, 1952, p. 471,476; engl. Ausg. S. 453, 456

  摘要：

  DOI：

文献信息

• PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20130171415A1

  公开（公告）日：2013-07-04

  Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R 1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R 2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar 1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R 2 s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.

  揭示了一种光敏树脂组合物，包括：（组分A）由式（1）表示的肟磺酸盐化合物；（组分B）包括具有可被酸分解的基团的树脂，该基团通过酸分解形成羧基或酚羟基；和（组分C）溶剂 其中在式（1）中，R1表示烷基、芳基或杂芳基，每个R2独立地表示氢原子、烷基、芳基或卤素原子，Ar1表示邻芳撑基或邻杂芳撑基，X表示O或S，n表示1或2，前提是在化合物中存在两个或两个以上的R2时，至少有一个表示烷基、芳基或卤素原子。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140005409A1

  公开（公告）日：2014-01-02

  A compound represented by the following formula (I): wherein in formula (I), R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfo group, a cyano group, an aryl group or a heteroaryl group; R 2 represents an alkyl group or an aryl group; each of R 3 and R 4 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, a carbonyl group or an aryl group; X represents —O—, —S—, —NH—, —NR 5 —, —CH 2 —, —CR 6 H— or —CR 6 R 7 —; each of R 5 to R 7 independently represents an alkyl group or an aryl group; and R 1 and any one of R 5 to R 7 , or R 3 and R 4 , may be bonded to each other to form a ring.

  化合物的化学式为(I)：在化学式(I)中，R1代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、酰基、氨基羰基团、磺胺基团、磺基、氰基、芳基或杂环芳基；R2代表烷基基团或芳基；R3和R4中的每一个独立代表氢原子、烷基基团、烯基基团、烷氧基团、烷氧羰基团、羰基或芳基；X代表—O—、—S—、—NH—、—NR5—、—CH2—、—CR6H—或—CR6R7—；R5到R7中的每一个独立代表烷基基团或芳基；R1和R5到R7中的任意一个，或R3和R4，可以相互连接形成环。
• POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME
  申请人：TAKITA Satoshi

  公开号：US20110177302A1

  公开（公告）日：2011-07-21

  According to one embodiment, a positive photosensitive resin composition includes a resin containing a specified acrylic acid besed-structural unit which generates a carboxyl group when its dissociative group is dissociated, which resin is insoluble in alkali or sparingly soluble in alkali but when its acid-dissociative group is dissociated, becomes soluble in alkali, a resin containing a structural unit derived from a radical-polymerizable monomer containing an epoxy group, a compound containing two or more epoxy groups in its molecule, provided that the resin containing the structural unit derived from a radical-polymerizable monomer containing an epoxy group is not included in this compound, and a compound that when exposed to actinic rays of 300 nm or longer wavelength, generates an acid.

  根据一种实施例，一种正性光敏树脂组合物包括以下成分：一种树脂，其包含一种特定的丙烯酸基结构单元，当其解离基团解离时生成羧基，该树脂在碱性溶液中不溶或难溶，但当其酸解离基团解离时，变得可溶于碱性溶液；一种树脂，其包含来源于含环氧基的自由基聚合单体的结构单元，以及一种分子中含有两个或更多环氧基的化合物，但该含有来源于含环氧基的自由基聚合单体的结构单元的树脂不包括在该化合物中；以及一种在受到300纳米或更长波长的光的作用下生成酸的化合物。
• HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD
  申请人：Tanaka Yuko

  公开号：US20110198730A1

  公开（公告）日：2011-08-18

  A method of synthesizing a hyperbranched polymer by living radical polymerization of a monomer in the presence of a metal catalyst includes at least adding a compound or setting the amount of the monomer in the living radical polymerization. The compound added is at least a compound represented by R 1 -A or a compound represented by R 2 —B—R 3 , where R 1 denotes hydrogen, an alkyl group (1-10 carbons), aryl group (1-10 carbons), or aralkyl group (7-10 carbons), A denotes a cyano group, hydroxyl group, or nitro group, R 2 and R 3 denote hydrogen, alkyl groups (1-10 carbons), aryl groups (6-10 carbons), aralkyl groups (7-10 carbons), or dialkylamino groups (2-10 carbons), and B denotes a carbonyl group or sulfonyl group. Setting of the monomer amount includes setting the amount of monomer to be mixed into a reaction system at one mixing to be less than the total monomer to be mixed with the reaction system.

  在金属催化剂的存在下，通过活性自由基聚合合成超支化聚合物的方法，至少包括添加化合物或调整活性自由基聚合中单体的量。添加的化合物至少是由R1-A表示的化合物或由R2-B-R3表示的化合物，其中R1表示氢、烷基（1-10个碳）、芳基（1-10个碳）或芳基烷基（7-10个碳），A表示氰基、羟基或硝基，R2和R3表示氢、烷基（1-10个碳）、芳基（6-10个碳）、芳基烷基（7-10个碳）或二烷基氨基基团（2-10个碳），B表示羰基或磺酰基。单体量的调整包括将单体的量设置为在一次混合中混合到反应体系中的单体总量以下。