MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150322027A1
公开(公告)日:2015-11-12
A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
The potential of merging photoredox and nickel catalysis to perform multicomponent alkene difunctionalizations under visible-light irradiation is demonstrated here. Secondary and tertiary alkyl groups, as well as sulfonyl moieties can be added to the terminal position of the double bond with simultaneous arylation of the internal carbon atom in a single step under mild reaction conditions. The process
In the presence of trimethylsilyl trifluoromethanesulfonate (TMSOTf) and methoxytrimethylsilane (MeOTMS), 2-oxopropyl acrylate and 2-oxocyclopentyl acrylate readily form cationic intermediates. The cationic moiety works efficiently as an electron-withdrawing group, and accelerates the Diels-Alder reaction under mild conditions.