Process for preparing fluorine-containing norbornene derivative
申请人:Araki Takayuki
公开号:US20070129576A1
公开(公告)日:2007-06-07
There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F
2
laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.