There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F
2
laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
提供了一种新型的诺伯烯衍
生物,用作F2激光
化学扩增型光刻胶的材料,具有优异的透明度和改进的干法蚀刻耐性,并且具有直接连接到诺伯烯骨架的含
氟酮基或含
氟三级醇基;使用该诺伯烯衍
生物作为共聚单体获得的含
氟聚合物;以及包括含
氟聚合物、光酸发生剂和溶剂的
化学扩增型光刻胶组合物。