4-mercapto-1,1-bis(trifluoromethyl)-1-butanol | 756896-34-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-mercapto-1,1-bis(trifluoromethyl)-1-butanol
• 英文别名: 2-(3-Mercaptopropyl)-1,1,1,3,3,3-hexafluoro-2-propanol；1,1,1-trifluoro-5-sulfanyl-2-(trifluoromethyl)pentan-2-ol
• CAS: 756896-34-1
• 化学式: C₆H₈F₆OS
• 分子量: 242.185
• InChiKey: OJRIMKKGHYINJA-UHFFFAOYSA-N

物化性质

• 沸点：
  218.9±40.0 °C(Predicted)
• 密度：
  1.408±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  21.2
• 氢给体数：
  2
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  4-acetylthio-1,1-bis(trifluoromethyl)-1-butanol 在 lithium aluminium tetrahydride 、 水 作用下， 以 四氢呋喃 为溶剂， 以99%的产率得到4-mercapto-1,1-bis(trifluoromethyl)-1-butanol
  参考文献：
  名称：

  金纳米颗粒通过氢键缔合的溶解度转换。

  摘要：

  制备了涂覆有六氟异丙醇部分的金纳米颗粒（AuNPs），并通过与各种胺的简单氢键缔合来改变其表面，从而使这些AuNPs在确定的有机溶剂中的溶解度得以定向。

  DOI：

  10.1039/b810932j

文献信息

• Thiol compound, copolymer and method for producing the copolymer
  申请人：Maruzen Petrochemical Co. Ltd.

  公开号：US07411097B2

  公开（公告）日：2008-08-12

  By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.

  通过解决现有技术中的异议，提供了一种新型共聚物，适用于涂层聚合物，具有对基底的优异附着性，并可作为具有耐细微图案形成中的图案坍塌耐久性的涂层膜的聚合物适当使用的方法，以及用于生产共聚物的新型硫醇化合物的方法。本发明的新型硫醇化合物具有公式（1）所表示的结构；其中R1是选择自具有1至15个碳原子的线性、支链或环状饱和碳氢化合物的双价取代基。
• Novel thiol compound, copolymer and method for producing the copolymer
  申请人：Yamagishi Takanori

  公开号：US20070161764A1

  公开（公告）日：2007-07-12

  By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R 1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.

  通过解决先前技术中的异议，提供了一种新型共聚物，适用于涂层聚合物，其在与基底的附着性方面表现出色，并可作为具有耐用性的涂层膜的聚合物，用于进步的半导体制造技术中的更细微图案形成的抗崩塌性。同时，还提供了一种制备该共聚物的方法以及一种新型硫醇化合物，可用作链转移剂。本发明的新型硫醇化合物具有式（1）所表示的结构，其中R1是从1到15个碳原子的线性、支链或环状饱和碳氢化合物中选择的双价取代基。
• Production process of copolymer for semiconductor lithography
  申请人：Yamagishi Takanori

  公开号：US20050096447A1

  公开（公告）日：2005-05-05

  Efficient and reproducible production of a copolymer for lithography, which has stable quality, with little lot-to-lot variations, and is suited for film-forming and coating compositions. Radical polymerization of a monomer, which contains at least one ethylenic double bond, with an initiator, in a solvent, and purification of the reaction mixture by precipitation and filtration, in a hermetically-closable single vessel divided by a filter medium, into a first section provided with fluid feeding means and agitating means, and a second section with fluid drawing means. Feeding the reaction mixture from the fluid feeding means into the first section of the vessel, containing a poor solvent, and contacting the reaction mixture with the poor solvent to precipitate a solid; and filtering the resulting fluid, containing the precipitated solid, through the filter medium, drawing the resultant filtrate through the fluid drawing means, and then separating the precipitated solid.

  高效、可重复地生产一种用于光刻技术的共聚物，该共聚物质量稳定，批次间差异小，适用于成膜和涂层组合物。将含有至少一个乙烯双键的单体与引发剂在溶剂中进行辐射聚合，并通过沉淀和过滤对反应混合物进行纯化，反应混合物在一个密封的、可封闭的容器中被过滤介质分成两个部分，第一部分装有流体进料装置和搅拌装置，第二部分装有流体抽吸装置。将反应混合物从流体进料装置送入容器的第一部分，其中装有贫溶剂，将反应混合物与贫溶剂接触，使固体沉淀；通过过滤介质过滤所产生的含有沉淀固体的流体，通过流体牵引装置牵引所产生的滤液，然后分离沉淀固体。
• Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process
  申请人：Yamagishi Takanori

  公开号：US20050131184A1

  公开（公告）日：2005-06-16

  Provided are a preparation process of a copolymer for semiconductor lithography, suited for a film forming composition used for the formation of minute patterns necessary for semiconductor fabrication, which comprises carrying out radical polymerization of at least two monomers having an ethylenic double bond in the presence of a polymerization initiator in a polymerization solvent, while causing to exist, in the solution containing the monomers, a polymerization inhibitive component; and a copolymer for semiconductor lithography prepared by the above-described process, and contains no high polymer, has excellent storage stability and generates remarkably less defects in resist pattern when used for semiconductor lithography.

  本发明提供了一种半导体光刻用共聚物的制备工艺，该共聚物适用于用于形成半导体制造所需的微小图案的成膜组合物，其包括在聚合引发剂存在下，在聚合溶剂中对至少两种具有乙烯双键的单体进行自由基聚合，同时使含有单体的溶液中存在聚合抑制组分；以及通过上述工艺制备的半导体光刻用共聚物，该共聚物不含高聚物，具有优异的贮存稳定性，用于半导体光刻时产生的抗蚀图案缺陷显著减少。
• PROCESS FOR REFINING CRUDE RESIN FOR RESIST
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1590709B1

  公开（公告）日：2013-04-03